High-throughput nanogap formation using single ramp feedback control

IEEE Transactions on Nanotechnology

Volumn 10, Issue 4, 2011, Pages 806-809

  Johnson, Stephen L ^a   Hunley, D Patrick ^a   Sundararajan, Abhishek ^a   Johnson, A T Charlie ^b   Strachan, Douglas R ^a  

^a UNIVERSITY OF KENTUCKY   (United States)

^b UNIVERSITY OF PENNSYLVANIA   (United States)

Author keywords

Electromigration; molecular electronics; nanoelectronics; nanogap electrodes; parallel nanogaps

Indexed keywords

APPLIED BIAS; APPLIED VOLTAGES; HIGH-THROUGHPUT; LOW IMPEDANCE; NANO-GAP; NANOGAP ELECTRODES; NANOGAPS; NANOJUNCTIONS; SELF-BALANCING; THERMAL RUNAWAYS; VOLTAGE CLAMP;

ELECTROMIGRATION; MOLECULAR ELECTRONICS;

FEEDBACK CONTROL;

EID: 79960271890     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2010.2080283     Document Type: Article

References (16)

1. T. Li, W. Hu, and D. Zhu, "Nanogap electrodes," Adv. Mat., vol. 21, pp. 1-15, 2009.
2. D. R. Strachan, D. E. Smith, D. E. Johnston, T.-H. Park, M. J. Therien, D. A. Bonnell, and A. T. Johnson, "Controlled fabrication of nanogaps in ambient environment for molecular electronics," Appl. Phys. Lett., vol. 86, pp. 043109-1-043109-3, 2005. (Pubitemid 40232203)
3. H. Park, A. K. L. Lim, J. Park, A. P. Alivisatos, and P. L. McEuen, "Fabrication of metallic electrodes with nanometer separation by electromigration," Appl. Phys. Lett., vol. 75, pp. 301-303, 1999. (Pubitemid 129561909)
4. A. A. Houck, J. Labaziewicz, E. K. Chan, J. A. Folk, and I. L. Chuang, "Kondo effect in electromigrated gold break junctions," Nano Lett., vol. 5, pp. 1685-1688, 2005. (Pubitemid 41396146)
5. D. E. Johnston, D. R. Strachan, and A. T. Johnson, "Parallel fabrication of nanogap electrodes," Nano Lett., vol. 7, pp. 2774-2777, 2007. (Pubitemid 47522437)
6. Z. M. Wu, M. Steinacher, R. Huber, M. Calame, S. J. van der Molen, and C. Schonenberger, "Feedback controlled electromigration in four-terminal nanojunctions," Appl. Phys. Lett., vol. 91, pp. 053118-1-053118-3, 2007.
7. S. L. Johnson, A. Sundararajan, D. P. Hunley, and D. R. Strachan, "Memristive switching of single-component metallic nanowires," Nanotechnology, vol. 21, pp. 125204-125208, 2010.
8. C. Y. Shih, S. Zheng, A. Chang, and Y.-C. Tai, "Nanometer gaps by feedback-controlled electromigration," in Proc. 12th Int. Conf. Solid-State Sens., Actuators Microsyst. (Transducers '03), Boston, MA, 2003, pp. 1530-1533.
9. D. R. Strachan, D. E. Johnston, B. S. Guiton, S. S. Datta, P. K. Davies, D. A. Bonnell, and A. T. Johnson, "Real-time TEM imaging of the formation of crystalline nano-scale gaps," Phys. Rev. Lett., vol. 100, pp. 056805-1-056805-4, 2008.
10. G. Esen and M. S. Fuhrer, "Temperature control of electromigration to form gold nanogap junctions," Appl. Phys. Lett., vol. 87, pp. 263101-1-263101-3, Dec. 26, 2005.
11. M. L. Trouwborst, S. J. V. d. Molen, and B. J. V.Wees, "The role of Joule heating in the formation of nanogaps by electromigration," J. Appl. Phys., vol. 99, pp. 114316-1-114316-7, 2006.
12. K. I. Bolotin, F. Kuemmeth, A. N. Pasupathy, and D. C. Ralph, "From ballistic transport to tunneling in electromigrated ferromagnetic breakjunctions," Nano Lett., vol. 6, pp. 123-127, 2006. (Pubitemid 43168341)
13. Z. K. Keane, L. H. Yu, and D. Natelson, "Magnetoresistance of atomicscale electromigrated nickel nanocontacts," Appl. Phys. Lett., vol. 88, pp. 062514-1-062514-3, 2006.
14. Y. Ohsawa, "Magnetoresistance in nanocontacts formed in NiFe thin films," in Proc. 52nd Annu. Conf. Magnetism Magn. Mater., Tampa, FL, 2008, pp. 07F302-1-07F302-3.
15. H. D. Chopra, M. R. Sullivan, J. N. Armstrong, and S. Z. Hua, "The quantum spin-valve in cobalt atomic point contacts," Nat. Mater., vol. 4, pp. 832-837, 2005.
16. M. D. Huntington, J. N. Armstrong, M. R. Sullivan, S. Z. Hua, and H. D. Chopra, "Mechanistic understanding of transition between quantized conductance plateaus under strain perturbation," Phys. Rev. B, vol. 78, pp. 035442-1-035442-9, 2008.