Kondo effect in electromigrated gold break junctions

Nano Letters

Volumn 5, Issue 9, 2005, Pages 1685-1688

  Houck, A A ^a,b   Labaziewicz, J ^a   Chan, E K ^a   Folk, J A ^a   Chuang, I L ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GOLD BREAK JUNCTIONS; KONDO IMPURITIES;

ELECTRIC CONDUCTANCE; IMPURITIES; RESONANCE; TEMPERATURE DISTRIBUTION; TRANSPORT PROPERTIES;

ELECTROMIGRATION;

EID: 25844487633     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl050799i     Document Type: Article

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