Visualization of single atomic steps on an ultra-flat Si(100) surface by advanced differential interference contrast microscopy

Electrochemical and Solid-State Letters

Volumn 14, Issue 9, 2011, Pages

  Kobayashi, Shin Ichiro ^a,b   Kim, Youn Geun ^a   Wen, Rui ^a   Yasuda, Kohei ^b   Fukidome, Hirokazu ^a   Suwa, Tomoyuki ^a   Kuroda, Rihito ^a   Li, Xiang ^a   Teramoto, Akinobu ^a   Ohmi, Tadahiro ^a   Itaya, Kingo ^a,b  

^a TOHOKU UNIVERSITY   (Japan)

^b Tohoku University ^*  (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC STEP; DIFFERENTIAL INTERFERENCE CONTRAST MICROSCOPES; DIFFERENTIAL INTERFERENCE CONTRAST MICROSCOPY; DYNAMIC PROCESS; ELECTROLYTE SOLUTIONS; LASER CONFOCAL MICROSCOPE; SI SURFACES; SI(100) SURFACE;

ATOMS; ELECTROLYTES; VISUALIZATION;

SILICON;

EID: 79960235736     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3597657     Document Type: Article

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