Optical and structural properties of WO3 as a function of the annealing temperature

Advances in Sensors, Signals and Materials - 3rd WSEAS International Conference on Sensors and Signals, SENSIG'10, 3rd WSEAS International Conference on Materials Science, MATERIALS'10

Volumn , Issue , 2010, Pages 99-104

  Diaz Reyes, J ^a   Flores Mena, J E ^b   Gutierrez Arias, J M ^b   Morin Castillo, M M ^b   Azucena Coyotecatl, H ^b   Galvan M ^c   Rodriguez Fragoso P ^c   Mendez Lopez A ^b  

^a INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

^b BENEMÉRITA UNIVERSIDAD AUTÓNOMA DE PUEBLA   (Mexico)

^c DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

Compound semiconductors; HFMOD; Novel materials and technological advances for electrochromics; Raman spectroscopy; Semiconductors growth; Transmittance spectroscopy; WO3 semiconductors; X ray; XPS

Indexed keywords

COMPOUND SEMICONDUCTORS; HFMOD; NOVEL MATERIALS; TRANSMITTANCE SPECTROSCOPY; WO3 SEMICONDUCTORS;

CRYSTALLINE MATERIALS; FILM GROWTH; MATERIALS SCIENCE; METALLIC COMPOUNDS; OXYGEN; OXYGEN VACANCIES; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SEMICONDUCTOR GROWTH; SENSORS; STRETCHING; X RAY DIFFRACTION;

ANNEALING;

EID: 79960120934     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (26)

1. CG Granqvist, Handbook of Electrochromic Materials (Amsterdam: Elsevier) 1995.
2. C. O. Avellaneda and L. O. S. Bulhões, Solid State Ionics, 165, 2003, pp. 117.
3. S. H. Lee, H. M. Cheong, P. Liu, D. Smith, C. Edwin Tracy, A. Mascanrenhas, J. R. Pitts and S. K. Deb, Journal of Applied Physics, 88, 2000, pp. 3076.
4. E. György, G. Socol, I. N. Mihailescu, C. Ducu and S. Ciuca, Journal of Applied Physics, 97, 2005, pp. 093527.
5. M. A. Gondal, A. Hameed, Z. H. Yamani and A. Suwaiyan, Chemical Physics Letters, 385, 2004, pp. 111.
6. M. Feng, A. L. Pan, H. R. Zhang, Z. A. Li, F. Liu, H. W. Liu, D. X. Shi, B. S. Zou and H. J. Gao, Applied Physics Letters, 86, 2005, pp. 141901.
7. R. Azimirad, O. Akhavan and A. Z. Moshfegh, Journal of Electrochemical Society, 153, 2006, pp. E11.
8. J. Hao, S. A. Studenikin and M. Cocivera, Journal of Applied Physics, 90, 2001, pp. 5064.
9. Y. Takeda, N. Kato, T. Fukano, A. Takeichi and T. Motohiro, Journal of Applied Physics, 96 (2004) 2417.
10. G. Garcia-Belmonte, P. R. Bueno, F. Fabregat-Santiago and J. Bisquert, Journal of Applied Physics, 96, 2004, pp. 853.
11. M. Seman and C. A. Wolden, Journal of Vacuum Science and Technology A, 21, 2003, pp. 1927.
12. J. Díaz-Reyes, V. Dorantes-García, A. Pérez- Benítez and J. A. Balderas-López, Superficies y Vacío, 21, 2008, pp. 12.
13. C. G. Granqvist, In The CRC Handbook of Solid State Electrochemistry, Gellings, P. J.; Bouwmesster, H. J. M. eds.; CRC Press, Inc.: Cleveland Ohio, 1997, ch. 16.
14. P. R. Bueno, F. M. Pontes, E. R. Leite, L. O. S. Bulhões, P. S. Pizani, P. N. Lisboa-Filho, W. H. Schreiner, Journal of Applied Physics, 96, 2004, pp. 2102.
15. M. F. Daniel, B. Desbat, J. C. Lassegues, R. Garie, Journal of Solid State Chemical, 73, 1988, pp. 127.
16. P. Tägtström, U. Jansson, Thin Solid Films, 352, 1999, pp. 107.
17. G. A. de Wijs, R. A. de Groot, Electrochimica Acta, 46, 2001, pp. 1989.
18. F. Daniel, B. Desbat, J. C. Lassegues, B. Gerand, M. Figlarz, Journal of Solid State Chemical, 67, 1987, pp. 235.
19. E. Salje, Acta Crystallographic A, 31, 1975, pp. 360.
20. A. Rougier, F. Portemer, A. Quédé, M. El Marssi, Applied Surface Science, 153, 1999, pp. 1.
21. M. Regragui, M. Addou, A. Outzourhit, J.C. Bernéde, Elb. El Idrissi, E. Benseddik, A. Kachouane, Thin Solid Films, 358, 2000, pp. 40.
22. J. V. Gabrusenoks, P. D. Cikmach, A.R. Lusis, J. J. Kleperis and G. M. Ramans, Solid State Ionics, 14, 1984, pp., 25.
23. D. Gazzoli, M. Valigi, R. Dragone, A. Marucci and G. Mattei, Journal of Physics Chemical B, 101, 1997, pp. 11129.
24. P. C. Liao, C. S. Chen, W. S. Ho, Y. S. Huang, and K. K. Tiong, Thin Solid Films, 301, 1997, pp. 7.
25. A. Portinha, V.Teixeira, J. Carneiro, M.F. Costa, N. P. Barradas, A. D. Sequeira, Surface and Coatings Technology, 188-189, 2004, pp. 107.
26. A. B. M. H. Rashid, M. Kishi, T. Katoda, Journal of Applied Physics, 80, 1996, pp. 3540.