Structural and optical characterization of WO 3 thin films for gas sensor applications

Journal of Applied Physics

Volumn 97, Issue 9, 2005, Pages

  Gyorgy E ^a   Socol, G ^a   Mihailescu, I N ^a   Ducu, C ^b   Ciuca, S ^c  

^a INSTITUTE OF ATOMIC PHYSICS   (Romania)

^b UNIVERSITY OF PITESTI   (Romania)

^c UNIVERSITY POLITEHNICA OF BUCHAREST   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT GAS PRESSURE; LASER CLEANING; MULTIPULSE LASER IRRADIATION; TUNGSTEN TRIOXIDE (WO3);

CHEMICAL SENSORS; ELECTROCHROMIC DEVICES; ELECTRONIC STRUCTURE; ENERGY DISPERSIVE SPECTROSCOPY; FILM GROWTH; OPACITY; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; TUNGSTEN COMPOUNDS;

THIN FILMS;

EID: 18844453442     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1889246     Document Type: Article

References (24)

1. J. S. E. M. Svensson and C. G. Granqvist, Sol. Energy Mater. 11, 29 (1984).
2. A. E. Aliev and H. W. Shin, Solid State Ionics 154-155, 425 (2002).
3. F. A. Cotton and G. Wilkinson, Advanced Organic Chemistry, 5th ed. (Wiley, New York, 1988), p. 829.
4. B. Stierna and C. G. Granqvist, Appl. Opt. 29, 117 (1991).
5. C. Cantalini, H. T. Sun, M. Faccio, M. Pelino, S. Santucci, L. Lozzi, and M. Passacantando, Sens. Actuators B 31, 81 (1996).
6. A. Agrawal and H. Habibi, Thin Solid Films 169, 257 (1989).
7. H. Meixner, J. Gerblinger, U. Lampe, and M. Fleischer, Sens. Actuators B 23, 119 (1995).
8. W. Gopel and K. D. Schierbaum, Sens. Actuators B 26-27, 1 (1995).
9. E. Ozkan, S. H. Lee, P. Liu, C. E. Tracy, F. Z. Tepehan, J. R. Pitts, and S. K. Deb, Solid State Ionics 149, 139 (2002).
10. P. Nelli, L. E. Depero, M. Ferroni, S. Groppelli, V. Guido, F. Ronconi, L. Sangaletti, and G. Sberveglieri, Sens. Actuators B 31, 89 (1996).
11. S. H. Lee, H. M. Cheong, C. E. Tracy, A. Mascarenhas, D. K. Benson, and S. K. Deb, Electrochim. Acta 44, 3111 (1999).
12. C. E. Tracy and D. K. Benson, J. Vac. Sci. Technol. A 4, 2377 (1986).
13. T. Brousse and D. M. Schleich, Sens. Actuators B 31, 77 (1996).
14. G. Fang, Z. Liu, and K. L. Yao, J. Phys. D 34, 2260 (2001).
15. Y. Zhao, Z. C. Feng, and Y. Liang, Sens. Actuators B 66, 171 (2000).
16. Pulsed Laser Deposition of Thin Films, edited by, D. G. Chrisey, and, G. K. Hubler, (Wiley, New York, 1994).
17. M. Von Allmen and A. Blatter, Laser-Beam Interactions with Materials, 2nd ed. (Springer, Berlin, 1995).
18. Powder Diffraction File, JCPDS International Centre for Diffraction Data, Pennsylvania, 1995.
19. C. G. Granqvist, Handbook of Inorganic Electrochromic Materials (Elsevier, Amsterdam, 1995).
20. S. H. Lee, H. M. Cheong, J. G. Zhang, A. Mascarenhas, D. K. Benson, and S. K. Deb, Appl. Phys. Lett. 74, 242 (1999).
21. A. Georg, W. Graf, R. Neumann, and V. Wittwer, Solid State Ionics 127, 319 (2000).
22. D. Bäuerle, Laser Processing and Chemistry (Springer, Berlin, 1996).
23. I. N. Mihailescu and E. György, Pulsed Laser Deposition: An Overview, in Trends in Optics and Photonics, edited by, T. Asakura, (Springer, Berlin, 1999), p. 201.
24. K. Murakami, in Laser Ablation of Electronic Materials-Basic Mechanisms and Applications, edited by, E. Fogarassy, and, S. Lazare, (Elsevier, Amsterdam, 1992), p. 125.