Influence of hot filaments arranging on substrate temperature during HFCVD of diamond films

Materials Letters

Volumn 56, Issue 5, 2002, Pages 832-837

  Song, G H ^a   Yoon, J H ^a   Kim, H S ^b   Sun, C ^c   Huang, R F ^c   Wen, L S ^c  

^a Changwon National University   (South Korea)

^b Korea Electrotechnology Research Institute (KERI)   (South Korea)

^c INSTITUTE OF METAL RESEARCH   (China)

Author keywords

Diamond film; HFCVD; Simulation; Substrate temperature distribution

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; FILM GROWTH; IRRADIATION; SUBSTRATES; TEMPERATURE DISTRIBUTION;

HOT FILAMENTS;

DIAMOND FILMS;

EID: 0036828186     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(02)00623-7     Document Type: Article

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