Charged particle multi-beam lithography evaluations for sub-16nm hp mask node fabrication and wafer direct write

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7488, Issue , 2009, Pages

  Platzgummer, Elmar ^a   Klein, Christof ^a   Joechl, Peter ^a   Loeschner, Hans ^a   Witt, Martin ^b   Pilz, Wolfgang ^b   Butschke, Joerg ^c   Jurisch, Michael ^c   Letzkus, Florian ^c   Sailer, Holger ^c   Irmscher, Mathias ^c  

^a IMS NANOFABRICATION AG   (Austria)

^b FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

^c Institut fur Mikroelektronik Stuttgart   (Germany)

Author keywords

Electron and ion projection optics; Mask and template writing; Multi beam lithography and nanopatterning

Indexed keywords

DIRECT WRITE; EVALUATION STUDY; ION PROJECTION; LEADING EDGE; MULTI-BEAM; PROGRAMMABLE APERTURE PLATES; PROJECTION OPTICS; PROOF OF CONCEPT;

AUTOMOBILE ELECTRONIC EQUIPMENT; ELECTRONS; IONS; OPTICS; PHOTOMASKS; PHOTORESISTS;

LITHOGRAPHY;

EID: 79959347680     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.832156     Document Type: Conference Paper

References (8)

1. Elmar Platzgummer, Hans Loeschner and Gerhard Gross: "Projection Mask-Less Patterning (PMLP) for the fabrication of leading-edge complex masks and nano-imprint templates", Proc. SPIE 6730 (2007).
2. Elmar Platzgummer, Hans Loeschner and Gerhard Gross, "Results obtained with the CHARPAN Engineering Tool and prospects of the ion Mask Exposure Tool (iMET)", Proc. SPIE 7122 (2008).
3. Joerg Butschke, Mathias Irmscher, Holger Sailer, Hans Loeschner and Elmar Platzgummer, "Go proton: investigation on mask patterning for the 22nm hp node using a ML2 multibeam system", Proc. SPIE 7379 (2009).
4. C. Klein, E. Platzgummer, J. Klikovits, W. Piller, H. Loeschner, T. Bejdak, P. Dolezel, V. Kolarik, W. Klingler, F. Letzkus, J. Butschke, M. Irmscher, M. Witt, W. Pilz, P. Jaschinsky, F. Thrum, C. Hohle, J. Kretz, J.T. Nogatch and A. Zepka, "PML2: the maskless multibeam solution for the 22nm node and beyond", Proc. SPIE. 7271 (2009).
5. The GDSII file was provided by Falco van Delft, Philips Research MiPlaza, Eindhoven, The Netherlands.
6. Elmar Platzgummer and Hans Loeschner, "Charged Particle Nanopatterning (CHARPAN)", t.b.p. in J. Vac. Sci. Technol. B, Nov/Dec issue (2009).
7. Christoph Ebm, Elmar Platzgummer, Gerhard Hobler, Anton Koeck, Rainer Hainberger, Markus Wellenzohn, Stefan Eder-Kapl, Peter Joechl, Marco Kuemmel, Ruediger Reitinger, Florian Letzkus, Mathias Irmscher and Hans Loeschner, "Ion Multi-Beam Nanopatterning for Photonic Applications: experiments and simulations, including study of precursor gas induced etching and deposition", t.b.p. in J. Vac. Sci. Technol. B, Nov/Dec issue (2009).
8. Joel K. W. Yang and Karl K. Berggren, "Using high-contrast self development of hydrogen silsesquioxane for sub-10-nm half-pitch lithography", J. Vac. Sci. Technol. B 25, 2025-2029 (2009). (Pubitemid 350255831)