Projection Mask-Less Patterning (PMLP) for the fabrication of leading-edge complex masks and nano-imprint templates

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Platzgummer, Elmar ^a   Loeschner, Hans ^a   Gross, Gerhard ^a  

^a IMS NANOFABRICATION AG   (Austria)

Author keywords

Ion multi beam patterning; Nanofabrication; Programmable aperture plate

Indexed keywords

NANOTECHNOLOGY; PHOTONICS;

ION MULTI-BEAM PATTERNING; PROGRAMMABLE APERTURE PLATES;

MASKS;

EID: 42149164867     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.746363     Document Type: Conference Paper

References (3)

1. J. Butschke et al.., SPIE Photomask / BACUS 2007, SPIE Proc. Vol. 6730-148.
2. E. Platzgummer et al.., Microelectronic Engineering 83, pp. 936-939 (2006).
3. Falco van Delft et al.., MNE 2007, Copenhagen, 23-26 Sept 2007, t.b.p. in Microeletronic Engngineering.