Go Proton: Investigation on Mask Patterning for the 22nm hp Node using a ML2 Multi Beam System

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7379, Issue , 2009, Pages

  Butschke, Joerg ^a   Irmscher, Mathias ^a   Sailer, Holger ^a   Loeschner, Hans ^b   Platzgummer, Elmar ^b  

^a Institut fur Mikroelektronik Stuttgart   (Germany)

^b IMS NANOFABRICATION AG   (Austria)

Author keywords

Hard mask; HSQ; Mask process; Multi beam; OMOG; Pattern generation; Proton

Indexed keywords

HARD MASK; HSQ; MASK PROCESS; MULTI BEAM; OMOG; PATTERN GENERATION;

ELECTRON BEAM LITHOGRAPHY; MOLYBDENUM; PHOTORESISTORS; PHOTORESISTS;

PROTONS;

EID: 69949123060     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824338     Document Type: Conference Paper

References (6)

1. E. Platzgummer et al. "Results obtained with the CHARPAN engineering tool and prospects of the ion mask exposure tool (iMET)", Proc. SPIE Vol. 7122 (2008) and BACUS Newsletter Feb 2009.
2. J. Butschke et al. "Mask patterning for the 22nm node using a proton multi beam projection pattern generator ", Proc. SPIE Vol. 7122 (2008) and BACUS Newsletter Jan 2009.
3. H. Namatsu et al., "Three-dimensional siloxane resist for the formation of nanopatterns with minimum line width fluctuations", J. Vac. Sci. Technol. B, Vol.16 (1998).
4. Charged Particle Nanotech / IP 515803-515812 CHARPAN / www.charpan.com.
5. F. Letzkus et al. "Deflection Unit for Multi-Beam Mask Making", Proc. SPIE Vol. 7122 (2008) and BACUS Newsletter Dec 2008.
6. F. Letzkus et al. "3D Si Aperture Plates combined with programmable Blanking Plates for Multi-Beam Mask Writing", submitted for SPIE Photomask BACUS 2009.