SCOPUS 정보 검색 플랫폼

Volumn 257, Issue 20, 2011, Pages 8350-8354

The microstructure and optical properties of crystallized hydrogenated silicon films prepared by very high frequency glow discharge

(4) Wang, Desheng a Yang, Zhibo a Li, Fei a He, Deyan a

a LANZHOU UNIVERSITY (China)

Author keywords

Nanocrystalline silicon; Optical property; Thin film

Indexed keywords

CRYSTALLINE MATERIALS; DEFECT DENSITY; DEPOSITION RATES; FILM PREPARATION; GLOW DISCHARGES; INFRARED DEVICES; METALLIC FILMS; NANOCRYSTALLINE SILICON; NANOCRYSTALS; OPTICAL PROPERTIES; REFRACTIVE INDEX; THIN FILMS; VOLUME FRACTION;

ABSORPTION CO-EFFICIENT; CRYSTALLINE VOLUME FRACTION; ENVELOPE METHOD; EXCITATION FREQUENCY; HYDROGENATED SILICON; SILANE CONCENTRATIONS; TRANSMISSION MODEL; VERY HIGH FREQUENCY;

OPTICAL FILMS;

EID: 79959327580 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2011.03.136 Document Type: Article

Times cited : (21)

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