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Applied Physics A: Materials Science and Processing

Volumn 103, Issue 4, 2011, Pages 1111-1116

Selective ablation-assisted two-photon stereolithography for effective nano- and microfabrication

(5) Lim, Tae Woo a Son, Yong a Yang, Dong Yol a Kong, Hong Jin a Lee, Kwang Sup b

a Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

b Hannam University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION PROCESS; FEMTO-SECOND LASER; HIGH-RESOLUTION PATTERNING; MECHANICAL SENSITIVITY; OPTICAL SCANNING SYSTEMS; PHOTOCURING; RESOLUTION LEVEL; TWO PHOTON; TWO-PHOTON STEREOLITHOGRAPHY;

ABLATION; FABRICATION; PHOTONS;

TWO PHOTON PROCESSES;

EID: 79959306546 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-010-6051-z Document Type: Article

Times cited : (9)

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