Selective inverse lithography methodology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7640, Issue , 2010, Pages

  Lim, Chinteong ^a   Temchenko, Vlad ^a   Niehoff, Martin ^b  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b Mentor Graphics Corporation   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT SOURCES; REPAIR;

193-NM EXPOSURE TOOLS; ADVANCED LIGHT SOURCE; ALTERNATIVE SOLUTIONS; INVERSE LITHOGRAPHY; OPTICAL PROXIMITY CORRECTIONS; OPTIMAL COMBINATION; RECURSIVE SEQUENCES; SELECTION CRITERIA;

PHOTOLITHOGRAPHY;

EID: 79959247503     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.845464     Document Type: Conference Paper

References (5)

1. Lim C., Temchenko V., et al., "Manufacturability of ILT patterns in low-NA 193nm environment," Proc. SPIE 7274, (2009).
2. Lim C., Temchenko V., et al., "Investigation of DFM-lite ORC Approach During OPC Simulation," Proc. SPIE 6520, (2007).
3. Temchenko V., Lim C., et al., "Coupled-dipole modeling for 3D mask simulation," Proc. SPIE 6924, (2008).
4. Hendrickx E., Tritchkov A., et al., "Hyper-NA imaging of 45nm node random CH layouts using inverse lithography," Proc. SPIE 6924, (2008).
5. Granik Y., Sakajiri K., et al., "On objectives and algorithms of inverse methods in microlithography," Proc. SPIE 6349, (2007).