Combination of rule and pattern based lithography unfriendly pattern detection in OPC flow

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Kang, Jae Hyun ^a   Choi, Jae Young ^a   Shim, Yeon Ah ^a   Lee, Hye Sung ^a   Su, Bo ^b   Chan, Walter ^b   Zhang, Ping ^b   Wu, Joanne ^b   Kim, Keun Young ^c  

^a Dongbu HiTek Co Ltd   (South Korea)

^b Anchor Semiconductor   (United States)

^c International Technology Alliances Inc   (United States)

Author keywords

Defect pattern library; Hot spot detection; Optical proximity correction (OPC); Pattern matching

Indexed keywords

CHIP DESIGNS; DEFECT PATTERN LIBRARY; DESIGN PATTERNS; DESIGN RULE CHECKS; DETECTION ALGORITHMS; EXACT MATCHES; FUZZY MATCHES; HOT SPOT DETECTION; HOT SPOTS; MODEL-BASED OPC; OPTICAL PROXIMITY CORRECTION (OPC); PATTERN DETECTIONS; PATTERN-MATCHING ALGORITHMS; PRODUCTION ENVIRONMENTS; RULE-BASED; SIMILAR PATTERNS; SPECIAL TREATMENTS; TECHNOLOGY NODES; TEMPLATE DATABASE;

ABERRATIONS; ALGORITHMS; CRYSTAL ORIENTATION; DEFECTS; INTEGRATED CIRCUITS; KNOWLEDGE BASED SYSTEMS; OPTICAL RESOLVING POWER; PATTERN MATCHING; SIGNAL DETECTION; TECHNOLOGY;

DESIGN;

EID: 62649100112     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.801312     Document Type: Conference Paper

References (7)

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2. T. Kotani et al, "Development of hot spot fixer", Proc. SPIE Vol. 6156-51(2006)
3. S. Kobayashi et al, "Process window aware layout optimization using hot spot fixing system", Proc. SPIE Vol. 6521-9(2007)
4. S. Kyoh et al, "Lithography oriented DFM for 65nm and beyond", Proc. SPIE Vol. 6156-14(2006)
5. Y.Shim et al, "Improvement on OPC completeness through pre-OPC hot spot detection and fix", Proc. SPIE Vol. 6925-37 (2008)
6. T. Kotani et al, "Yield enhanced layout generation by new design for manufacturing", Proc. SPIE Vol. 5379(2003)
7. Y. Kim et al, "Application of modified Jog-fill DRC rule on LFD OPC flow", Proc. SPIE Vol. 6730-137 (2007)