SCOPUS 정보 검색 플랫폼

Plasma Sources Science and Technology

Volumn 18, Issue 4, 2009, Pages

Simulation of resistive microwave resonator probe for high-pressure plasma diagnostics

(4) Xu, Jinzhou a,b Nakamura, Keji b Zhang, Qi b Sugai, Hideo b

a DONGHUA UNIVERSITY (China)

b CHUBU UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTENNA RESONANCE; COLLISIONAL PLASMA; ELECTRON COLLISION FREQUENCY; ELECTRON DENSITIES; ELECTRON-MOLECULE COLLISIONS; FINITE DIFFERENCE TIME DOMAINS; HIGH PRESSURE; IN-VACUUM; LINEARLY PROPORTIONAL; MAXIMUM VALUES; MICROWAVE RESONANCE; MICROWAVE RESONATORS; RESONANCE ANALYSIS; RESONANCE WIDTH; RESONANT FREQUENCIES; SIMULATION RESULT; TRANSMISSION LINE;

CARRIER CONCENTRATION; ELECTROMAGNETIC FIELDS; ELECTRON DENSITY MEASUREMENT; FINITE DIFFERENCE TIME DOMAIN METHOD; HIGH PRESSURE LIQUID CHROMATOGRAPHY; MICROWAVE DEVICES; MICROWAVES; NATURAL FREQUENCIES; PLASMA COLLISION PROCESSES; PLASMA DIAGNOSTICS; PROBES; SIMULATORS; VACUUM;

ELECTRONS;

EID: 70350655962 PISSN: 09630252 EISSN: 13616595 Source Type: Journal
DOI: 10.1088/0963-0252/18/4/045009 Document Type: Article

Times cited : (43)

References (11)

1
- 0027694351
- Shirakawa T and Sugai H 1993 Japan. J. Appl. Phys. 32 5129
- (1993) Japan. J. Appl. Phys. , vol.32 , Issue.PART 1 , pp. 5129
- Shirakawa, T.¹ Sugai, H.²

2
- 0029389782
- Ahn T H, Nakamura K and Sugai H 1995 Japan. J. Appl. Phys. 34 L1405
- (1995) Japan. J. Appl. Phys. , vol.34 , Issue.PART 2 , pp. 1405
- Ahn, T.H.¹ Nakamura, K.² Sugai, H.³

3
- 0032070028
- Schwabedissen A, Benck E C and Roberts J R 1998 Plasma Sources Sci. Technol. 7 119
- (1998) Plasma Sources Sci. Technol. , vol.7 , Issue.2 , pp. 119
- Schwabedissen, A.¹ Benck, E.C.² Roberts, J.R.³

4
- 0033322118
- Kokura H, Nakamura K, Ghanashev I P and Sugai H 1999 Japan. J. Appl. Phys. 38 5262
- (1999) Japan. J. Appl. Phys. , vol.38 , Issue.PART 1 , pp. 5262
- Kokura, H.¹ Nakamura, K.² Ghanashev, I.P.³ Sugai, H.⁴

5
- 0037273377
- Nakamura K, Ohata M and Sugai H 2003 J. Vac. Sci. Technol. 21 325
- (2003) J. Vac. Sci. Technol. , vol.21 , Issue.1 , pp. 325
- Nakamura, K.¹ Ohata, M.² Sugai, H.³

6
- 0016951486
- Stenzel R L 1976 Rev. Sci. Instrum. 47 603
- (1976) Rev. Sci. Instrum. , vol.47 , Issue.5 , pp. 603
- Stenzel, R.L.¹

7
- 1942542301
- Piejak P B, Godyak V A, Garner P, Alexandrovich B M and Sternberg N 2004 J. Appl. Phys. 95 3785
- (2004) J. Appl. Phys. , vol.95 , Issue.7 , pp. 3785
- Piejak, P.B.¹ Godyak, V.A.² Garner, P.³ Alexandrovich, B.M.⁴ Sternberg, N.⁵

8
- 70350673014
- Yajima S, Nakamura K and Sugai H 2005 Proc. Int. Symp. Dry Process (Jeju, South Korea, 2005) p 213
- (2005) Proc. Int. Symp. Dry Process , pp. 213
- Yajima, S.¹ Nakamura, K.² Sugai, H.³

9
- 70350673013
- Kim H, Nakamura K and Sugai H 2006 Proc. Int. Symp. Dry Process (Tokyo, Japan, 2006) p 55
- (2006) Proc. Int. Symp. Dry Process , pp. 55
- Kim, H.¹ Nakamura, K.² Sugai, H.³

10
- 84889416744
- Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing 2nd edn (New Jersey: Wiley)
- (2005) Principles of Plasma Discharges and Materials Processing
- Lieberman, M.A.¹ Lichtenberg, A.J.²

11
- 0004148832
- Umran S Inan and Aziz S Inan 1999 Engineering Electromagnetics (California: Addison Wesley Longman) p 137
- (1999) Engineering Electromagnetics , pp. 137
- Inan, U.S.¹ Inan, A.S.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.