Diagnostics and control of high-density etching plasmas

Materials Research Society Symposium - Proceedings

Volumn 406, Issue , 1996, Pages 15-25

  Sugai, H ^a   Nakamura, K ^a   Ahn, T H ^a   Nakamura, M ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; COOLING; ELECTRON DENSITY MEASUREMENT; ELECTRONS; IONS; PLASMA DENSITY; PLASMA DIAGNOSTICS; PLASMA ETCHING;

CHLORINE ATOMS; ETCH SELECTIVITY; HIGH DENSITY ETCHING PLASMAS; HOT WALL ETCHING MODE; INDUCTIVELY COUPLED PLASMAS; NEGATIVE IONS;

PLASMAS;

EID: 0029734637     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (18)