Chemical composition, crystallographic structure and impedance spectroscopy of titanium oxynitride TiNxOy thin films

Solid State Ionics

Volumn 192, Issue 1, 2011, Pages 693-698

  Radecka, M ^a   Pamula, E ^a   Trenczek Zajac, A ^a   Zakrzewska, K ^a   Brudnik, A ^a   Kusior, E ^a   Kim Ngan, N T H ^b   Balogh, A G ^c  

^a AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Poland)

^b PEDAGOGICAL UNIVERSITY   (Poland)

^c DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Impedance spectroscopy; Rutherford backscattering; Thin films; Titanium oxynitrides

Indexed keywords

CHEMICAL COMPOSITIONS; CRYSTALLOGRAPHIC STRUCTURE; ELECTRICAL CONDUCTIVITY; GRAZING INCIDENCE; IMPEDANCE SPECTROSCOPY; IMPEDANCE SPECTROSCOPY MEASUREMENTS; OXYGEN CONTENT; PLASMA EMISSION SPECTROSCOPY; PSEUDO-EQUILIBRIUM; REACTIVE ATMOSPHERES; RUTHERFORD BACK-SCATTERING; SURFACE IMAGE; TERNARY PHASE DIAGRAMS; TITANIUM OXYNITRIDE;

ATOMIC FORCE MICROSCOPY; BACKSCATTERING; ELECTRIC CONDUCTIVITY; EMISSION SPECTROSCOPY; OXYGEN; PHASE DIAGRAMS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SURFACE ROUGHNESS; THIN FILMS; TITANIUM; TITANIUM NITRIDE; X RAY DIFFRACTION;

SEMICONDUCTING FILMS;

EID: 79958775048     PISSN: 01672738     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssi.2010.07.021     Document Type: Conference Paper

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