SCOPUS 정보 검색 플랫폼

Materials Science in Semiconductor Processing

Volumn 14, Issue 2, 2011, Pages 94-96

Characteristics of GZO thin films deposited by solgel dip coating

(4) Kalaivanan, A a Perumal, S b Neelakanda Pillai, N a Murali, K R c

a Arignar Anna College (India)

b S T HINDU COLLEGE (India)

c CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE (India)

Author keywords

IIVI; Solgel coating; Thin films; ZnO

Indexed keywords

ACRYLAMIDES; BAND-GAP VALUES; DOPANT CONCENTRATIONS; DOPED SAMPLE; GRAIN SIZE; HEXAGONAL STRUCTURES; IIVI; SHORT-WAVELENGTH; SOL GEL DIP COATING; SOLGEL COATING; ZNO;

AMIDES; COATINGS; GALLIUM; OXIDE FILMS; THIN FILMS; ZINC COATINGS; ZINC OXIDE;

SEMICONDUCTOR DOPING;

EID: 79958148812 PISSN: 13698001 EISSN: None Source Type: Journal
DOI: 10.1016/j.mssp.2011.01.002 Document Type: Article

Times cited : (16)

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