Epitaxy of Si nanocrystals by molecular beam epitaxy on a crystalline insulator LaAlO3(0 0 1)

Journal of Crystal Growth

Volumn 323, Issue 1, 2011, Pages 247-249

  Mortada, Hussein ^a   Dentel, Didier ^a   Derivaz, Mickael ^a   Bischoff, Jean Luc ^a   Denys, Emmanuel ^a   Moubah, Reda ^b   Ulhaq Bouillet, Corinne ^b   Werckmann, Jacques ^b  

^a UNIVERSITÉ DE HAUTE ALSACE   (France)

^b INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

Author keywords

Crystal morphology; Molecular beam epitaxy; Nanostrucutres; Oxides; Silicon

Indexed keywords

CRYSTAL MORPHOLOGIES; CRYSTALLINE INSULATORS; CRYSTALLINE OXIDES; DEPOSITION TEMPERATURES; EPITAXIAL RELATIONSHIPS; GROWTH MECHANISMS; HIGH DIELECTRIC CONSTANTS; NANODOTS; NANOSTRUCUTRES; SI FILMS; SI NANOCRYSTAL; SI(0 0 1); SI-SI BONDS; VOLMER-WEBER MODES; XPS;

BINDING ENERGY; CRYSTALLINE MATERIALS; EPITAXIAL GROWTH; LANTHANUM ALLOYS; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; NANOCRYSTALS; SILICA; SILICATES; SILICON;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 79957993280     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2010.10.007     Document Type: Article

References (13)

1. X.B. Lu, P.F. Lee, and J.Y. Dai Applied Physics Letters 86 2005 203111
2. K. Onishi, C.S. Kang, R. Choi, H.J. Cho, S. Gopalan, R.E. Nieh, S.A. Krishnan, and J.C. Lee IEEE Transactions on Electron Devices 50 2003 384
3. X.B. Lu, X. Zhang, R. Huang, H.B. Lu, Z.H. Chen, W.F. Xiang, M. He, B.L. Cheng, H.W. Zhou, X.P. Wang, C.Z. Wang, and B.Y. Nguyen Applied Physics Letters 84 2004 2620
4. D.O. Klenov, D.G. Schlom, H. Li, and S. Stemmer Japanese Journal of Applied Physics 44 2005 L617
5. Y.Y. Mi, Z. Yu, S.J. Wang, P.C. Lim, Y.L. Foo, A.C.H. Huan, and C.K. Ong Applied Physics Letters 90 2007 181925
6. Tang Jin-Long, Zhu Jun, Qin Wen-Feng, Xiong Jie, and Li Yan-Rong Chinese Physics 17 2008 655
7. R.J. Jaccodine Journal of the Electrochemical Society 110 1963 524
8. J.P. Jacobs, M.A. san Miguel, and L.J. Alvarez Journal of Molecular Structure (Theochem) 390 1997 193
9. J.E. Griffith, and D.A. Grigg Journal of Applied Physics 74 1993 83
10. G. Hollinger, and F.J. Himpsel Applied Physics Letters 44 1984 93
11. W.F. Xiang, Y.Z. Liu, H.B. Lu, L. Yan, M. He, and Z.H. Chen Thin Solid Films 515 2006 2722
12. C. Merckling Microelectronics Reliability 47 2007 540
13. Q.Y. Shao, A.D. Li, J.B. Cheng, H.Q. Ling, D. Wu, Z.G. Liu, N.B. Ming, C. Wang, H.W. Zhou, and B.Y. Nguyen Applied Physics A 81 2005 1181