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Volumn 7971, Issue , 2011, Pages

Optical illumination optimization for patterned defect inspection

Author keywords

bright field microscopy; dark field microscopy; Defect detection; illumination optimization; Scatterfield optical microscopy

Indexed keywords

BRIGHT-FIELD MICROSCOPY; DARK-FIELD MICROSCOPY; DEFECT DETECTION; ILLUMINATION OPTIMIZATION; SCATTERFIELD OPTICAL MICROSCOPY;

EID: 79956113803     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.882313     Document Type: Conference Paper
Times cited : (11)

References (8)
  • 2
    • 33750466565 scopus 로고    scopus 로고
    • Illumination optimization for optical semiconductor metrology
    • Barnes, B. M., Howard, L., and Silver, R. M., "Illumination optimization for optical semiconductor metrology", Proc. SPIE 6289, 62890P (2006).
    • (2006) Proc. SPIE , vol.6289
    • Barnes, B.M.1    Howard, L.2    Silver, R.M.3
  • 4
    • 0019047028 scopus 로고
    • Application of the Finite-Difference Time-Domain Method to Sinusoidal Steady-State Electromagnetic-Penetration Problems
    • Taflove A., "Application of the Finite-Difference Time-Domain Method to Sinusoidal Steady-State Electromagnetic-Penetration Problems," IEEE Trans. Electromagnetic Compatibility EMC-22, 191-202 (1980).
    • (1980) IEEE Trans. Electromagnetic Compatibility , vol.EMC-22 , pp. 191-202
    • Taflove, A.1
  • 5
    • 0027666768 scopus 로고
    • An adaptive approach to the numerical solution of Fresnel's wave equation
    • Schmidt, F., "An adaptive approach to the numerical solution of Fresnel's wave equation," IEEE J. Lightwave Technol. 11, 1425-1434 (1993).
    • (1993) IEEE J. Lightwave Technol. , vol.11 , pp. 1425-1434
    • Schmidt, F.1
  • 6
    • 79958057817 scopus 로고    scopus 로고
    • Defect metrology challenges at the 11-nm node and beyond
    • Crimmins, T.F., "Defect metrology challenges at the 11-nm node and beyond", Proc. SPIE 7638, 76380H (2010).
    • (2010) Proc. SPIE , vol.7638
    • Crimmins, T.F.1
  • 8
    • 70449637785 scopus 로고    scopus 로고
    • 193 nm angle-resolved scatterfield microscope for semiconductor metrology
    • Sohn, Y.-J. Quintanilha, R., Barnes, B. M., and Silver, R.M. "193 nm angle-resolved scatterfield microscope for semiconductor metrology," Proc. SPIE 7405, 74050R (2009).
    • (2009) Proc. SPIE , vol.7405
    • Sohn, Y.-J.1    Quintanilha, R.2    Barnes, B.M.3    Silver, R.M.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.