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Volumn 7405, Issue , 2009, Pages

193 Nm angle-resolved scatterfield microscope for semiconductor metrology

Author keywords

Angle resolved; Conjugate back focal plane; Illumination; Scatterfield microscopy

Indexed keywords

193 NM EXCIMER LASERS; ANGULAR SCANNING; APERTURE SIZES; BACK FOCAL PLANES; CRITICAL DIMENSION; GRATING TARGETS; MEASUREMENT RESULTS; NANO SCALE; NUMERICAL APERTURE; SEMICONDUCTOR METROLOGY;

EID: 70449637785     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.830683     Document Type: Conference Paper
Times cited : (20)

References (10)
  • 2
    • 51749111775 scopus 로고    scopus 로고
    • Optical through-focus technique that differentiates small changes in line width, line height and sidewall angle for CD, overlay, and defect metrology applications
    • R. Attota, Richard Silver, and B. M. Barnes, "Optical through-focus technique that differentiates small changes in line width, line height and sidewall angle for CD, overlay, and defect metrology applications, " Proc. SPIE 6922, 6922E-1 (2008).
    • (2008) Proc. SPIE , vol.6922
    • Attota, R.1    Silver, R.2    Barnes, B.M.3
  • 6
    • 35148858951 scopus 로고    scopus 로고
    • Kohler illumination analysis for high-resolution optical metrology using 193 nm light
    • Y. J. Sohn, Richard M. Silver, "Kohler illumination analysis for high-resolution optical metrology using 193 nm light, " Proc. SPIE 6518, 65184V (2007).
    • (2007) Proc. SPIE , vol.6518
    • Sohn, Y.J.1    Silver, R.M.2
  • 7
    • 70449681443 scopus 로고    scopus 로고
    • Analysis of köhler illumination for 193 nm scatterfield microscope
    • Y. J. Sohn, R. Quintanilha, Lowell Howard, and R. M. Silver, "Analysis of Köhler illumination for 193 nm scatterfield microscope, " Proc. SPIE 7272, 72723T (2009).
    • (2009) Proc. SPIE , vol.7272
    • Sohn, Y.J.1    Quintanilha, R.2    Howard, L.3    Silver, R.M.4
  • 8
    • 70449648292 scopus 로고    scopus 로고
    • Critical dimension measurements using a 193 nm scatterfield microscope
    • R. Quintanilha, Y. Sohn, B. M. Barnes, L. Howard, and R. Silver "Critical dimension measurements using a 193 nm scatterfield microscope, " Proc. SPIE 7390, 73900S (2009).
    • (2009) Proc. SPIE , vol.7390
    • Quintanilha, R.1    Sohn, Y.2    Barnes, B.M.3    Howard, L.4    Silver, R.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.