Defect metrology challenges at the 11 nm node and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7638, Issue , 2010, Pages

  Crimmins, Timothy F ^a   Raymond, Christopher J ^a  

^a INTEL CORPORATION   (United States)

Author keywords

defect inspection; ebeam inspection; super resolution

Indexed keywords

COMPLEX DEVICES; DEFECT CONTRAST; DEFECT INSPECTION; EBEAM INSPECTION; END USERS; EXOTIC MATERIALS; IN-LINE INSPECTIONS; INDUSTRY NEEDS; PATHFINDING; POSSIBLE FUTURES; SUPER RESOLUTION; TECHNICAL CHALLENGES;

DEFECTS; EXTREME ULTRAVIOLET LITHOGRAPHY; INSPECTION; LITHOGRAPHY; NANOTECHNOLOGY; OPTICAL RESOLVING POWER; UNITS OF MEASUREMENT;

PROCESS CONTROL;

EID: 79958057817     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846623     Document Type: Conference Paper

References (14)

1. http://public.itrs.net/Links/2009ITRS/Home2009.htm CROSS CUT A Tables
2. Born, M., Wolf E., "Principles of Optics: Electromagnetic Theory of Propagation, Interference and Diffraction of Light, Cambridge University Press, Cambridge, p. 759.
3. ibid.
4. Hell, S. W. , "Far-Field Optical Nanoscopy", Science, 316, p. 1153, (2007).
5. ibid
6. Grbic, A., Jiang, L., Merlin, R., "Near-Field Plates: Subdiffraction Focusing with Patterned Surfaces", Science 320, 511-513 (2008).
7. Toledo-Crow, R.; Smith, B.W.; Rogers, J.K.; Vaez-Iravani, M., "Near field optical microscopy characterization of IC metrology", Proc. of the 2196, 62-73 (1994) .
8. Kauranen M., Husu H., Kujala S., et. al., "Role of local fields and defects in the nonlinear response of metal nanosctructures", Proc. of SPIE 7032, 70321J, (2008).
9. Silver R. M., Stocker M. A., Bishop, M., et. al "High-resolution Optical Metrology" Proc. SPIE 5752 p. 67, (2005).
10. Thomas C. E., Bahm T. M., Baylor L. R., et. al., "Direct to digital holography for semiconductor wafer defect detection and review", Proc. SPIE 4692, 180 (2002).
11. Xiao H., Ma L., Wang F., et. al. "Inspection of 32nm imprinted patterns with an advanced e-beam inspection system", Proc. of SPIE Vol. 7488, 74881V
12. Hayashi, H., Oomura, M., Ihata, N., Shinkawa, A., et. al., "Detection of critical defects with E-beam technology for development and monitoring of advanced NAND processes" Advanced Semiconductor Manufacturing Conference, 2009. ASMC '09. IEEE/SEMI.
13. ibid
14. Xiao H., Ma L., Wang F., et. al. "Inspection of 32nm imprinted patterns with an advanced e-beam inspection system", Proc. of SPIE Vol. 7488, 74881V