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Diamond and Related Materials

Volumn 20, Issue 5-6, 2011, Pages 711-716

Hydrogen plasma etching of diamond films deposited on graphite

(4) Villalpando, I a John, P a Porro, S a Wilson, J I B a

a HERIOT WATT UNIVERSITY (United Kingdom)

Author keywords

CVD diamond; Diamond etching; Diamond on graphite; Hydrogen plasma erosion; Raman spectroscopy; XPS

Indexed keywords

CVD DIAMOND; ETCH MECHANISM; ETCHED FILMS; HYDROGEN PLASMA EROSION; HYDROGEN PLASMAS; HYDROGEN-PLASMA ETCHING; MICROWAVE PLASMA-ENHANCED CVD; NANOCRYSTALLINE DIAMOND FILMS; PREFERENTIAL ETCHING; STEP FLOW; SURFACE OXYGEN; XPS;

DIAMONDS; GRAPHITE; HYDROGEN; PHOTOELECTRON SPECTROSCOPY; PLASMA DEPOSITION; PLASMA ETCHING; PLASMAS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; VOLTAGE DIVIDERS; X RAY PHOTOELECTRON SPECTROSCOPY;

DIAMOND FILMS;

EID: 79956107349 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/j.diamond.2011.03.007 Document Type: Article

Times cited : (40)

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