Stepped growth and etching of (001) diamond

Diamond and Related Materials

Volumn 5, Issue 9, 1996, Pages 1002-1005

  Hayashi, Kazushi ^a,c   Yamanaka, Sadanori ^b,c   Okushi, Hideyo ^c   Kajimura, Koji ^b,c  

^a KOBE STEEL LTD   (Japan)

^b UNIVERSITY OF TSUKUBA   (Japan)

^c ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

Chemical vapor deposition; Homoepitaxial diamond film; Hydrogen plasma etching; Step flow epitaxy

Indexed keywords

EID: 0000982698     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/0925-9635(95)00470-X     Document Type: Article

References (10)

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