Contact line dynamics of a superhydrophobic surface: Application for immersion lithography

Microfluidics and Nanofluidics

Volumn 10, Issue 6, 2011, Pages 1351-1357

  Gnanappa, Arun Kumar ^a   Gogolides, Evangelos ^a   Evangelista, Fabrizio ^b   Riepen, Michel ^b  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b ASML   (Netherlands)

Author keywords

Dynamic contact angle; Hydrophobic; Receding contact angle; Shedding; Water loss; Wetting

Indexed keywords

DYNAMIC CONTACT ANGLE; HYDROPHOBIC; RECEDING CONTACT; SHEDDING; WATER LOSS;

CONTACT ANGLE; ROLLING RESISTANCE; SURFACE CHEMISTRY; SURFACE PROPERTIES; VELOCITY;

HYDROPHOBICITY;

EID: 79956103126     PISSN: 16134982     EISSN: 16134990     Source Type: Journal    
DOI: 10.1007/s10404-010-0762-5     Document Type: Article

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