Optimization of equipment for 193-nm immersion processing

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue II, 2005, Pages 799-806

  Niwa, Takafumi ^a   Enomoto, Masashi ^a   Shimura, Satoru ^a   Kyoda, Hideharu ^a   Kawasaki, Tetsu ^a   Kitano, Junichi ^a  

^a TOKYO ELECTRON LTD   (Japan)

Author keywords

CD; Defect; Immersion

Indexed keywords

COATINGS; DEFECTS; KNOWLEDGE BASED SYSTEMS; OPTIMIZATION; WATER;

CRITICAL DIMENSION (CD); IMMERSION; INLINE TOOLS; WAFER PROCESSING;

PHOTORESISTS;

EID: 24644481370     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.598686     Document Type: Conference Paper

References (2)

1. S. Owa, H. Nagasaka, Y. Ishii, O. Hirakawa, T. Yamamoto, Proc. SPIE 5377, 264 (2004)
2. A. Raub, A. Fraenglass, S. Bruecki, W. Conley, R. Dammel, A. Romano, M. Sato, W. Hinsberg, Proc. SPIE 5377, 306 (2004)