Modeling and experimental investigation of bubble entrapment for flow over topography during immersion lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 5, Issue 1, 2006, Pages

  Burnett, Holly B ^a   Wei, Alex C ^a   El Morsi, Mohamed S ^a   Shedd, Timothy A ^a   Nellis, Gregory F ^a   Van Peski, Chris ^b   Grenville, Andrew ^b,c  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b SEMATECH   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

Bubbles; Entrainment; Fluid flow; Immersion lithography

Indexed keywords

AIR GAP; ENTRAINMENT; HYDROPHOBIC SURFACE; IMMERSION LITHOGRAPHY;

COMPUTATIONAL FLUID DYNAMICS; CONTACT ANGLE; FLOW OF FLUIDS; IMAGING SYSTEMS; LITHOGRAPHY; REFRACTIVE INDEX; SCANNING;

BUBBLES (IN FLUIDS);

EID: 33748567412     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2158818     Document Type: Article

References (5)

1. M. Switkes and M. Rothschild, "Resolution enhancement of 157 nm lithography by liquid immersion," J. Microlithogr., Microfabr., Microsyst. 1(3), 225-228 (2002).
2. A. Wei, M. El-Morsi, G. Nellis, A. Abdo, and R. Engelstad, "Predicting air entrainment due to topography during the filling and scanning process for immersion lithography," J. Vac. Sci. Technol. B 22(6), 3444-3449 (2004).
3. D. Gil, T. A. Brunner, C. Fonseca, N. Seong, R. Streefkerk, C. Wagner, and M. Stavenga, "Immersion lithography: New opportunities for semiconductor manufacturing," The 48th Int. Conf. Electron, Ion and Photon Beam Technology and Nanofabrication, San Diego, CA, June 1-4, 2004.
4. J. Petrov, R. Sedev, and P. Petrov, "Effect of geometry on steady wetting kinetics and critical velocity of film entrainment," Adv. Colloid Interface Sci. 38, 229-269 (1992).
5. A. C. Wei, "Thermofluid simulations for immersion lithography, " PhD Thesis, University of Wisconsin, Madison (2004).