Metallized pyramidal silicon probe with extremely high throughput and resolution capability for optical near-field technology

Applied Physics Letters

Volumn 80, Issue 13, 2002, Pages 2257-2259

  Yatsui, T ^a   Itsumi, K ^b   Kourogi, M ^b   Ohtsu, M ^b  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

APERTURE DIAMETER; ENERGY DISTRIBUTIONS; FIBER PROBE; HIGH THROUGHPUT; LOCALIZED SURFACE PLASMON RESONANCE; NUMERICAL RESULTS; OPTICAL NEAR FIELD; PROBE TIPS; RESOLUTION CAPABILITY; SILICON PROBE; SILICON STRUCTURES; SPOT SIZES;

FINITE DIFFERENCE TIME DOMAIN METHOD; METALLIZING; PROBES; SURFACE PLASMON RESONANCE; TIME DOMAIN ANALYSIS;

THROUGHPUT;

EID: 79956022332     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1465520     Document Type: Article

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