Triplex molecular layers with nonlinear nanomechanical response

Applied Physics Letters

Volumn 80, Issue 25, 2002, Pages 4825-4827

  Tsukruk, V V ^a   Ahn, H S ^b   Kim, D ^b   Sidorenko, A ^a  

^a Iowa State University of Science and Technology   (United States)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL GRAFTING; COMPOSITE MODULUS; COMPRESSION RESISTANCE; EFFECTIVE MECHANISMS; HARD LAYERS; MECHANICAL ENERGY DISSIPATION; MOLECULAR DESIGN; MOLECULAR LAYER; NANOMECHANICAL DEFORMATION; NANOMECHANICAL RESPONSE; NANOSCALE WEAR; RUBBER LAYER; RUBBER MATRIX; SILICON OXIDE SURFACES; SURFACE NANOSTRUCTURE; TRILAYERS;

DEFORMATION; ENERGY DISSIPATION; RUBBER; SILICON COMPOUNDS; SILICON OXIDES; STRUCTURES (BUILT OBJECTS); WEAR RESISTANCE;

GRAFTING (CHEMICAL);

EID: 79956014573     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1486267     Document Type: Article

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