Impurity-free disordering mechanisms in GaAs-based structures using doped spin-on silica layers

Applied Physics Letters

Volumn 80, Issue 23, 2002, Pages 4351-4353

  Deenapanray, Prakash N K ^a   Gong, Bin ^b   Lamb, R N ^b   Martin, A ^c   Fu, L ^a   Tan, H H ^a   Jagadish, C ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^b UNIVERSITY OF NEW SOUTH WALES   (Australia)

^c LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

GAAS; GAAS-BASED STRUCTURES; GAAS/ALGAAS QUANTUM WELL; IMPURITY-FREE DISORDERING; SILICA LAYERS; SPIN-ON;

ARSENIC; DEEP LEVEL TRANSIENT SPECTROSCOPY; DEFECTS; GALLIUM ARSENIDE; SEMICONDUCTOR QUANTUM WELLS; SILICA; X RAY PHOTOELECTRON SPECTROSCOPY;

SEMICONDUCTING GALLIUM;

EID: 79956003212     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1484244     Document Type: Article

References (12)

1. For a comprehensive review of impurity-free vacancy interdiffusion, see, for example, Semiconductor Quantum Wells Intermixing, Optoelectronic Properties of Semiconductors and Superlattices, Vol. 8, edited by E. H. Li (Gordon and Breach, Amsterdam, 2000).
2. P. N. K. Deenapanray, H. H. Tan, C. Jagadish, and F. D. Auret, Appl. Phys. Lett. 77, 696 (2000). apl APPLAB 0003-6951
3. P. N. K. Deenapanray, H. H. Tan, C. Jagadish, and F. D. Auret, J. Appl. Lett. 88, 5255 (2000).
4. P. N. K. Deenapanray, A. Martin, and C. Jagadish, Appl. Phys. Lett. 79, 2561 (2001). apl APPLAB 0003-6951
5. A. Pépin, C. Vieu, M. Schneider, H. Launois, and Y. Nissim, J. Vac. Sci. Technol. B 15, 142 (1997). jvb JVTBD9 0734-211X
6. P. N. K. Deenapanray and C. Jagadish, Electrochem. Solid-State Lett. 4, G11 (2001). 8sw ESLEF6 1099-0062
7. P. N. K. Deenapanray and C. Jagadish, J. Vac. Sci. Technol. B 19, 1962 (2001). jvb JVTBD9 0734-211X
8. P. Cusumano, B. S. Ooi, A. Saher Helmy, S. G. Ayling, A. C. Bryce, J. H. Marsh, B. Voegele, and M. J. Rose, J. Appl. Phys. 81, 2445 (1997). jap JAPIAU 0021-8979
9. G. Li, S. J. Chua, S. J. Xu, X. C. Wang, A. Saher Helmy, M.-L. Ke, and J. H. Marsh, Appl. Phys. Lett. 73, 3393 (1998). apl APPLAB 0003-6951
10. L. Fu, P. N. K. Deenapanray, H. H. Tan, C. Jagadish, L. V. Dao, and M. Gal, Appl. Phys. Lett. 76, 837 (2000). apl APPLAB 0003-6951
11. L. Fu, R. W. v. d. Heijden, H. H. Tan, C. Jagadish, L. V. Dao, and M. Gal, Appl. Phys. Lett. 80, 1171 (2002). apl APPLAB 0003-6951
12. E. V. K. Rao, A. Hamoudi, Ph. Krauz, M. Juhel, and H. Thibierge, Appl. Phys. Lett. 66, 472 (1995). apl APPLAB 0003-6951