Novel approaches to meet the requirements for double patterning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Ebihara, Takeaki ^a   Yoshihara, Toshiyuki ^a   Morohoshi, Hiroshi ^a   Makiyama, Tadamasa ^a   Kawanobe, Yoshio ^a   Tsujita, Koichiro ^a   Kojima, Toshiyuki ^a   Takahashi, Kazuhiro ^a  

^a CANON INC   (Japan)

Author keywords

CDU; Distortion; DP; Exposure tool; K1 TUNE; Overlay

Indexed keywords

CDU; DISTORTION; DP; EXPOSURE TOOL; K1 TUNE; OVERLAY;

DATA STORAGE EQUIPMENT; DYNAMIC POSITIONING; OPTICAL VARIABLES MEASUREMENT; PERCOLATION (SOLID STATE); TUNING;

EXPOSURE METERS;

EID: 65849507049     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813585     Document Type: Conference Paper

References (3)

1. ITRS roadmap 2008 update, http://www.itrs.net/Links/2008ITRS/Home2008.htm
2. Koichiro Tsujita, et.al, "Illumination optimization with actual information of exposure tool and resist process", Proc. SPIE 6520-116 (2007)
3. Koichiro Tsujita, et.al, "Impact of optimization conditions on the result at optimizing illumination and mask", Proc. SPIE 6924-101 (2008)