Mesoporous tin-doped indium oxide thin films: Effect of mesostructure on electrical conductivity

Science and Technology of Advanced Materials

Volumn 12, Issue 2, 2011, Pages

  Graberg, Till Von ^a   Hartmann, Pascal ^a   Rein, Alexander ^a   Gross, Silvia ^b   Seelandt, Britta ^c   Röger, Cornelia ^d   Zieba, Roman ^d   Traut, Alexander ^d   Wark, Michael ^c   Janek, Jürgen ^a   Smarsly, Bernd M ^a  

^a JUSTUS LIEBIG UNIVERSITY   (Germany)

^b CNR   (Italy)

^c LEIBNIZ UNIVERSITY HANNOVER   (Germany)

^d BASF SE   (Germany)

Author keywords

electrical properties; functionalization; ITO; porous materials; thin films

Indexed keywords

CONDUCTION PATHS; CONDUCTIVE COATINGS; CROSS SECTION; DIP COATING; ELECTRICAL CONDUCTIVITY; ELECTRICAL PROPERTY; ELECTRODE MATERIAL; ENHANCED CONDUCTIVITY; FUNCTIONALIZATION; IMPEDANCE MEASUREMENT; IN-PLANE; ITO; ITO FILMS; MESO-PORES; MESOPOROUS; MESOSTRUCTURES; POLY(ISOBUTYLENE); PORE WALL; PRIMARY NANOPARTICLES; PRUSSIAN BLUE; REDUCING ATMOSPHERE; SPECIFIC RESISTANCES; TEMPLATE SIZES; TIN DOPED INDIUM OXIDE; VERSATILE METHODS;

BLOCK COPOLYMERS; BUTENES; COPOLYMERIZATION; ELECTRIC CONDUCTIVITY; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMICAL PROPERTIES; INDIUM; MESOPOROUS MATERIALS; OXIDE FILMS; PLASTIC COATINGS; THIN FILMS; TIN;

FILM PREPARATION;

EID: 79955896952     PISSN: 14686996     EISSN: None     Source Type: Journal    
DOI: 10.1088/1468-6996/12/2/025005     Document Type: Article

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