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Volumn 109, Issue 8, 2011, Pages

Nitrogen plasma treatment of fluorine-doped tin oxide for enhancement of photo-carrier collection in amorphous Si solar cells

(2) Baik, Seung Jae a Lim, Koeng Su a

a Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SI; BANDBENDING; BUILT-IN VOLTAGE; DEPOSITION TIME; FILL FACTOR; FLUORINE DOPED TIN OXIDE; NITROGEN PLASMA TREATMENT; P-TYPE; PHOTOCARRIER; SERIES RESISTANCES; SHORT WAVELENGTHS; SURFACE BAND BENDING; SURFACE DEPLETION; WINDOW LAYER;

FLUORINE; NANOCOMPOSITES; NITROGEN; NITROGEN PLASMA; OPEN CIRCUIT VOLTAGE; PLASMA APPLICATIONS; SILICON CARBIDE; SOLAR CELLS; TIN; TIN OXIDES;

AMORPHOUS SILICON;

EID: 79955708883 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3572262 Document Type: Article

Times cited : (8)

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