Structural and magnetic properties of TiZrNi thin films prepared by magnetron sputtering and thermal annealing

Journal of Nanoscience and Nanotechnology

Volumn 10, Issue 11, 2010, Pages 7804-7807

  Shin, Hyemin ^a   Cho, Soo Bin ^a   Lee, Ik Jae ^b   Yu, Chung Jong ^b   Kim, Jae Yong ^a  

^a Hanyang University   (South Korea)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

Annealing; Magnetic Property; Magnetron Sputtering; Thin Film; Ti Based Alloys

Indexed keywords

A-THERMAL; DEPOSITED LAYER; IN-VACUUM; MAGNETIC BEHAVIOR; MAGNETIZATION VALUES; MAGNETRON SPUTTERING METHOD; METASTABLE PHASE; NOMINAL COMPOSITION; QUASICRYSTALLINE PHASE; STRUCTURAL AND MAGNETIC PROPERTIES; THERMAL-ANNEALING; THIN LAYERS; TI BASED ALLOY;

ANNEALING; CERIUM; MAGNETIC PROPERTIES; MAGNETISM; MAGNETRON SPUTTERING; METASTABLE PHASES; TITANIUM ALLOYS; ZIRCONIUM;

THIN FILMS;

EID: 79955543799     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2010.2893     Document Type: Conference Paper

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