Deposition and characterisation of Al-Cu-Fe thin films

Thin Solid Films

Volumn 459, Issue 1-2, 2004, Pages 267-270

  Čekada, Miha ^a   Panjan, Peter ^a   Jurić, Dalija ^a   Dolinšek, Janez ^a,b   Zalar, Anton ^a  

^a JO EF STEFAN INSTITUTE   (Slovenia)

^b UNIVERSITY OF LJUBLJANA   (Slovenia)

Author keywords

AlCuFe; Quasicrystals; Sputtering; Thin films

Indexed keywords

ALUMINUM ALLOYS; ANNEALING; DEPOSITION; DIFFUSION; ELECTRIC CONDUCTIVITY; INERT GASES; MICROHARDNESS; MULTILAYERS; PHASE COMPOSITION; TARGETS; TRIODES; X RAY DIFFRACTION ANALYSIS;

ALCUFE; PRECURSOR MATERIALS; TRIODE DEPOSITION SYSTEMS;

THIN FILMS;

EID: 2942592393     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.12.110     Document Type: Conference Paper

References (7)

1. Janot C. Quasicrystals. 1994;Clarendon Press, Oxford. p. 90.
2. Haugeneder A., Eisenhammer T., Mahr A., Schneider J., Wendel M. Thin Solid Films. 307:1997;120-125.
3. Kanjilal A., Tiwari U., Chatterjee R. Mater. Res. Bull. 37:2002;343-351.
4. Teghil R., D'Alessio L., Simone M.A., Zaccagnino M., Ferro D., Sordelet D.J. Appl. Surf. Sci. 168:2000;267-269.
5. Fleury E., Lee S.M., Kim W.T., Kim D.H. J. Non-Cryst. Solids. 278:2000;194-204.
6. Bonasso S., Pigeat P., Rouxel D., Weber B. Thin Solid Films. 409:2002;165-171.
7. Grenet T., Giroud F., Joulaud J.L., Capitan M. Phil. Mag. A. 82:(16):2002;2909-2922.