Comparison between the piezoresistive properties of a-SiC films obtained by PECVD and magnetron sputtering

Materials Science Forum

Volumn 679-680, Issue , 2011, Pages 217-220

  Fraga, M A ^a,b  

^a Institute for Advanced Studies   (Brazil)

^b INSTITUTO TECNOLÓGICO DE AERONÁUTICA   (Brazil)

Author keywords

Gauge factor; PECVD; Piezoresistive properties; RF magnetron sputtering; Silicon carbide

Indexed keywords

MAGNETRON SPUTTERING; PLASMA CVD; SILICON CARBIDE; STRAIN GAGES; THIN FILMS;

BEAM BENDING; GAUGE FACTORS; LIFT-OFF PROCESS; PIEZORESISTIVE PROPERTIES; RF-MAGNETRON SPUTTERING; SIC FILMS; SIC THIN FILMS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 79955098401     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/MSF.679-680.217     Document Type: Conference Paper

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