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Indian Journal of Physics

Volumn 84, Issue 10, 2010, Pages 1347-1354

Study of field emission and dielectric properties of AlN films prepared by DC sputtering technique at different substrate temperatures

(4) Thapa, R a Saha, B a Goswami, S b Chattopadhyay, K K a,b

a Thin Film and Nanoscience Laboratory (India)

b JADAVPUR UNIVERSITY (India)

Author keywords

AlN thin film; Dielectric property; Field emission

Indexed keywords

EID: 79953828309 PISSN: 09731458 EISSN: 09749845 Source Type: Journal
DOI: 10.1007/s12648-010-0125-9 Document Type: Article

Times cited : (12)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.