-
1
-
-
7544247006
-
-
10.1063/1.1790587
-
E. M. C. Fortunato, P. M. C. Barquinha, A. M. B. G. Pimentel, A. M. F. Gonalves, A. J. S. Marques, R. F. P. Martins, and L. M. N. Pereira, Appl. Phys. Lett., 85, 2541 (2004). 10.1063/1.1790587
-
(2004)
Appl. Phys. Lett.
, vol.85
, pp. 2541
-
-
Fortunato, E.M.C.1
Barquinha, P.M.C.2
Pimentel, A.M.B.G.3
Gonalves, A.M.F.4
Marques, A.J.S.5
Martins, R.F.P.6
Pereira, L.M.N.7
-
2
-
-
20644459026
-
Transparent thin-film transistors with zinc indium oxide channel layer
-
DOI 10.1063/1.1862767, 064505
-
N. L. Dehuff, E. S. Kettenring, D. Hong, H. Q. Chiang, J. F. Wager, R. L. Hoffman, C. H. Park, and D. A. Keszler, J. Appl. Phys., 97, 064505 (2005). 10.1063/1.1862767 (Pubitemid 40833716)
-
(2005)
Journal of Applied Physics
, vol.97
, Issue.6
, pp. 1-5
-
-
Dehuff, N.L.1
Kettenring, E.S.2
Hong, D.3
Chiang, H.Q.4
Wager, J.F.5
Hoffman, R.L.6
Park, C.-H.7
Keszler, D.A.8
-
3
-
-
9744248669
-
Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
-
DOI 10.1038/nature03090
-
K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, and H. Hosono, Nature, 432, 488 (2004). 10.1038/nature03090 (Pubitemid 39585210)
-
(2004)
Nature
, vol.432
, Issue.7016
, pp. 488-492
-
-
Nomura, K.1
Ohta, H.2
Takagi, A.3
Kamiya, T.4
Hirano, M.5
Hosono, H.6
-
4
-
-
0038362743
-
Thin-film transistor fabricated in single-crystalline transparent oxide semiconductor
-
DOI 10.1126/science.1083212
-
K. Nomura, H. Ohta, K. Ueda, T. Kamiya, M. Hirano, and H. Hosono, Science, 300, 1260 (2003). 10.1126/science.1083212 (Pubitemid 36621429)
-
(2003)
Science
, vol.300
, Issue.5623
, pp. 1269-1272
-
-
Nomura, K.1
Ohta, H.2
Ueda, K.3
Kamiya, T.4
Hirano, M.5
Hosono, H.6
-
5
-
-
67649103774
-
-
10.1063/1.3151827
-
G. H. Kim, B. D. Ahn, H. S. Shin, W. H. Jeong, H. J. Kim, and H. J. Kim, Appl. Phys. Lett., 94, 233501 (2009). 10.1063/1.3151827
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 233501
-
-
Kim, G.H.1
Ahn, B.D.2
Shin, H.S.3
Jeong, W.H.4
Kim, H.J.5
Kim, H.J.6
-
6
-
-
56749166069
-
-
10.1149/1.2976027
-
G. H. Kim, H. S. Shin, B. D. Ahn, K. H. Kim, W. J. Park, and H. J. Kim, J. Electrochem. Soc., 156, H7 (2009). 10.1149/1.2976027
-
(2009)
J. Electrochem. Soc.
, vol.156
, pp. 7
-
-
Kim, G.H.1
Shin, H.S.2
Ahn, B.D.3
Kim, K.H.4
Park, W.J.5
Kim, H.J.6
-
7
-
-
65149090679
-
-
10.1016/j.tsf.2009.01.151
-
G. H. Kim, H. S. Kim, H. S. Shin, B. D. Ahn, K. H. Kim, and H. J. Kim, Thin Solid Films, 517, 4007 (2009). 10.1016/j.tsf.2009.01.151
-
(2009)
Thin Solid Films
, vol.517
, pp. 4007
-
-
Kim, G.H.1
Kim, H.S.2
Shin, H.S.3
Ahn, B.D.4
Kim, K.H.5
Kim, H.J.6
-
8
-
-
13544269370
-
High mobility transparent thin-film transistors with amorphous zinc tin oxide channel layer
-
DOI 10.1063/1.1843286, 013503
-
H. Q. Chiang, J. F. Wager, R. L. Hoffman, J. Jeong, and D. A. Keszler, Appl. Phys. Lett., 86, 013503 (2005). 10.1063/1.1843286 (Pubitemid 40219489)
-
(2005)
Applied Physics Letters
, vol.86
, Issue.1
, pp. 0135031-0135033
-
-
Chiang, H.Q.1
Wager, J.F.2
Hoffman, R.L.3
Jeong, J.4
Keszler, D.A.5
-
9
-
-
67649103774
-
-
10.1063/1.3151827
-
G. H. Kim, B. D. Ahn, H. S. Shin, W. H. Jeong, H. J. Kim, and H. J. Kim, Appl. Phys. Lett., 94, 233501 (2009). 10.1063/1.3151827
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 233501
-
-
Kim, G.H.1
Ahn, B.D.2
Shin, H.S.3
Jeong, W.H.4
Kim, H.J.5
Kim, H.J.6
-
10
-
-
34249697083
-
High mobility bottom gate InGaZnO thin film transistors with Si Ox etch stopper
-
DOI 10.1063/1.2742790
-
M. K. Kim, J. H. Jeong, H. J. Lee, T. K. Ahn, H. S. Shin, J. S. Park, J. K. Jeong, Y. G. Mo, and H. D. Kim, Appl. Phys. Lett., 90, 212114 (2007). 10.1063/1.2742790 (Pubitemid 46828080)
-
(2007)
Applied Physics Letters
, vol.90
, Issue.21
, pp. 212114
-
-
Kim, M.1
Jeong, J.H.2
Lee, H.J.3
Ahn, T.K.4
Shin, H.S.5
Park, J.-S.6
Jeong, J.K.7
Mo, Y.-G.8
Kim, H.D.9
-
11
-
-
34250621864
-
-
10.1002/adma.v19:6
-
D. H. Lee, Y. J. Chang, G. S. Herman, and C. H. Chang, Adv. Mater. (Weinheim, Ger.), 19, 843 (2007). 10.1002/adma.v19:6
-
(2007)
Adv. Mater. (Weinheim, Ger.)
, vol.19
, pp. 843
-
-
Lee, D.H.1
Chang, Y.J.2
Herman, G.S.3
Chang, C.H.4
-
12
-
-
56749166069
-
-
10.1149/1.2976027
-
G. H. Kim, H. S. Shin, B. D. Ahn, K. H. Kim, W. J. Park, and H. J. Kim, J. Electrochem. Soc., 156, H7 (2009). 10.1149/1.2976027
-
(2009)
J. Electrochem. Soc.
, vol.156
, pp. 7
-
-
Kim, G.H.1
Shin, H.S.2
Ahn, B.D.3
Kim, K.H.4
Park, W.J.5
Kim, H.J.6
-
13
-
-
39749191514
-
Electronic transport properties of amorphous indium-gallium-zinc oxide semiconductor upon exposure to water
-
DOI 10.1063/1.2838380
-
J. S. Park, J. K. Jeong, H. J. Chung, Y. G. Mo, and H. D. Kim, Appl. Phys. Lett., 92, 072104 (2008). 10.1063/1.2838380 (Pubitemid 351304848)
-
(2008)
Applied Physics Letters
, vol.92
, Issue.7
, pp. 072104
-
-
Park, J.-S.1
Jeong, J.K.2
Chung, H.-J.3
Mo, Y.-G.4
Kim, H.D.5
-
14
-
-
52949097961
-
-
10.1063/1.2990657
-
J. K. Jeong, H. W. Yang, J. H. Jeong, Y. G. Mo, and H. D. Kim, Appl. Phys. Lett., 93, 123508 (2008). 10.1063/1.2990657
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 123508
-
-
Jeong, J.K.1
Yang, H.W.2
Jeong, J.H.3
Mo, Y.G.4
Kim, H.D.5
-
15
-
-
44449163569
-
Effectively enhanced oxygen sensitivity of individual ZnO tetrapod sensor by water preadsorption
-
DOI 10.1063/1.2938047
-
K. H. Zheng, Y. C. Zhao, K. Deng, Z. Liu, L. F. Sun, Z. X. Zhang, L. Song, H. F. Yang, C. Z. Gu, and S. S. Xie, Appl. Phys. Lett., 92, 213116 (2008). 10.1063/1.2938047 (Pubitemid 351770378)
-
(2008)
Applied Physics Letters
, vol.92
, Issue.21
, pp. 213116
-
-
Zheng, K.H.1
Zhao, Y.C.2
Deng, K.3
Liu, Z.4
Sun, L.F.5
Zhang, Z.X.6
Song, L.7
Yang, H.F.8
Gu, C.Z.9
Xie, S.S.10
-
16
-
-
78951475277
-
-
10.1149/1.3526097
-
W. F. Chung, T. C. Chang, H. W. Li, C. W. Chen, Y. C. Chen, S. C. Chen, T. Y. Tseng, and Y. H. Tai, Electrochem. Solid-State Lett., 14, H114 (2011). 10.1149/1.3526097
-
(2011)
Electrochem. Solid-State Lett.
, vol.14
, pp. 114
-
-
Chung, W.F.1
Chang, T.C.2
Li, H.W.3
Chen, C.W.4
Chen, Y.C.5
Chen, S.C.6
Tseng, T.Y.7
Tai, Y.H.8
-
18
-
-
49249142162
-
-
10.1016/0039-6028(79)90411-4
-
N. Yamazoe, J. Fuchigami, M. Kishikawa, and T. Seiyama, Surf. Sci., 86, 335 (1979). 10.1016/0039-6028(79)90411-4
-
(1979)
Surf. Sci.
, vol.86
, pp. 335
-
-
Yamazoe, N.1
Fuchigami, J.2
Kishikawa, M.3
Seiyama, T.4
-
19
-
-
0024641396
-
-
10.1149/1.2096854
-
Y. Shimizu, M. Shimabukuro, H. Arai, and T. Seiyama, J. Electrochem. Soc., 136, 1206 (1989). 10.1149/1.2096854
-
(1989)
J. Electrochem. Soc.
, vol.136
, pp. 1206
-
-
Shimizu, Y.1
Shimabukuro, M.2
Arai, H.3
Seiyama, T.4
-
20
-
-
1642528449
-
Control of catalytic reactions at the surface of a metal oxide nanowire by manipulating electron density inside it
-
DOI 10.1021/nl034968f
-
Y. Zhang, A. Kolmakov, S. Chretien, H. Metiu, and M. Moskovits, Nano Lett. 4, 403 (2004). 10.1021/nl034968f (Pubitemid 38402622)
-
(2004)
Nano Letters
, vol.4
, Issue.3
, pp. 403-407
-
-
Zhang, Y.1
Kolmakov, A.2
Chretien, S.3
Metiu, H.4
Moskovits, M.5
-
21
-
-
0017526328
-
-
10.1063/1.324156
-
J. Lagowski, E. S. Sproles, Jr., and H. C. Gatos, J. Appl. Phys. 48, 3566 (1977). 10.1063/1.324156
-
(1977)
J. Appl. Phys.
, vol.48
, pp. 3566
-
-
Lagowski, J.1
Sproles, Jr.E.S.2
Gatos, H.C.3
-
22
-
-
66549085976
-
-
10.1063/1.3126713
-
Y. Muraoka, N. Takubo, and Z. Hiroi, J. Appl. Phys., 105, 103702 (2009). 10.1063/1.3126713
-
(2009)
J. Appl. Phys.
, vol.105
, pp. 103702
-
-
Muraoka, Y.1
Takubo, N.2
Hiroi, Z.3
|