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Journal of Vacuum Science and Technology B

Volumn 29, Issue 2, 2011, Pages

Rapid fabrication of bilayer graphene devices using direct laser writing photolithography

(9) Leon, J A a Alves, E S a Elias, D C a Brant, J C a Barbosa, T C a Malard, L M a Pimenta, M A a Ribeiro, G M a Plentz, F a

a FEDERAL UNIVERSITY OF MINAS GERAIS (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; GRAPHENE; PHOTORESISTS; TEMPERATURE DISTRIBUTION;

BILAYER GRAPHENE; DEGREE OF FLEXIBILITY; DIRECT LASER WRITING; FOUR-TERMINAL RESISTANCE; LOW CARRIER DENSITY; RAPID FABRICATION; RESISTIVITY BEHAVIOR; TEMPERATURE DEPENDENCE;

GRAPHENE DEVICES;

EID: 79953769773 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3556978 Document Type: Article

Times cited : (14)

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