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Journal of the Electrochemical Society

Volumn 158, Issue 5, 2011, Pages

Influence of oxygen to argon ratio on the properties of RF magnetron sputtered Ba0.7Sr0.3TiO3 thin films

(3) Reshmi, R a Jayaraj, M K a Sebastian, M T b

a Department of Physics (India)

b REGIONAL RESEARCH LABORATORY CSIR (India)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION COEFFICIENTS; BAND GAPS; BST THIN FILMS; CRYSTALLISATION; ELECTRICAL PROPERTY; ELECTRO-OPTICS; HIGH REFRACTIVE INDEX; INFLUENCE OF OXYGEN; LOW SUBSTRATE TEMPERATURE; NONLINEAR OPTICAL DEVICES; OPTICAL PARAMETER; OPTICAL PROPERTIES OF THIN FILMS; RF MAGNETRONS; RF-MAGNETRON SPUTTERING; SPUTTERING GAS; TIO; TUNABILITIES; WIDE BAND GAP;

ARGON; BARIUM; BARIUM STRONTIUM TITANATE; BARIUM TITANATE; ELECTRIC PROPERTIES; ENERGY GAP; FUSED SILICA; LIGHT REFRACTION; MAGNETRON SPUTTERING; OPTICAL INSTRUMENTS; OPTIMIZATION; OXYGEN; REFRACTIVE INDEX; REFRACTOMETERS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON WAFERS; STRONTIUM; STRONTIUM TITANATES; SUBSTRATES; THIN FILMS;

OPTICAL FILMS;

EID: 79953222610 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3566094 Document Type: Article

Times cited : (6)

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