Epitaxial ferroelectric Ba0.5Sr0.5TiO3 thin films for room-temperature tunable element applications

Applied Physics Letters

Volumn 75, Issue 3, 1999, Pages 412-414

  Chen, C L ^a   Feng, H H ^a   Zhang, Z ^a   Brazdeikis, A ^a   Huang, Z J ^a,d   Chu, W K ^a   Chu, C W ^a   Miranda, F A ^b   Van Keuls, F W ^b   Romanofsky, R R ^b   Liou, Y ^c  

^a University of Houston   (United States)

^b NASA GLENN RESEARCH CENTER   (United States)

^c INSTITUTE OF PHYSICS   (Taiwan)

^d Wafertech Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BARIUM TITANATE; CRYSTAL ORIENTATION; DEPOSITION; EPITAXIAL GROWTH; FERROELECTRIC MATERIALS; ION BOMBARDMENT; LANTHANUM COMPOUNDS; LASER ABLATION; MICROWAVE DEVICES; PERMITTIVITY; PULSED LASER APPLICATIONS; THIN FILMS;

BARIUM STRONTIUM TITANATE;

DIELECTRIC FILMS;

EID: 0032622021     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124392     Document Type: Article

References (21)

1. For example, Epitaxial Oxide Thin Films III, edited by D. G. Schlom, C. B. Eom, M. E. Hawley, C. M. Foster, and J. S. Speck [Mater. Res. Soc. Symp. Proc. 474, 1 (1997)]; Ferroelectric Thin Films II, edited by A. I. Kingon, E. R. Myers, and B. A. Tuttle [Mater. Res. Soc. Symp. Proc. 243, 1 (1991)].
2. For example, Epitaxial Oxide Thin Films III, edited by D. G. Schlom, C. B. Eom, M. E. Hawley, C. M. Foster, and J. S. Speck [Mater. Res. Soc. Symp. Proc. 474, 1 (1997)]; Ferroelectric Thin Films II, edited by A. I. Kingon, E. R. Myers, and B. A. Tuttle [Mater. Res. Soc. Symp. Proc. 243, 1 (1991)].
3. For example, Epitaxial Oxide Thin Films III, edited by D. G. Schlom, C. B. Eom, M. E. Hawley, C. M. Foster, and J. S. Speck [Mater. Res. Soc. Symp. Proc. 474, 1 (1997)]; Ferroelectric Thin Films II, edited by A. I. Kingon, E. R. Myers, and B. A. Tuttle [Mater. Res. Soc. Symp. Proc. 243, 1 (1991)].
4. For example, Epitaxial Oxide Thin Films III, edited by D. G. Schlom, C. B. Eom, M. E. Hawley, C. M. Foster, and J. S. Speck [Mater. Res. Soc. Symp. Proc. 474, 1 (1997)]; Ferroelectric Thin Films II, edited by A. I. Kingon, E. R. Myers, and B. A. Tuttle [Mater. Res. Soc. Symp. Proc. 243, 1 (1991)].
5. J-P. Maria, S. Trolier-McKinstry, and D. G. Schlom, ISAF '96: Proceedings of the Tenth IEEE International Symposium on Applications of Ferroelectrics, 1996, Vol. 1, p. 333.
6. A. T. Findikoglu, Q. X. Jia, I. H. Campbell, X. D. Wu, D. Reagor, C. B. Mombourquette, and D. McMurry, Appl. Phys. Lett. 66, 3674 (1995).
7. M. Izuha, K. Abe, M. Koike, S. Takeno, and N. Fukushima, Appl. Phys. Lett. 70, 1405 (1997); M. Izuha, K. Abe, and N. Fukushima, Jpn. J. Appl. Phys., Part 1 36, 5866 (1997).
8. M. Izuha, K. Abe, M. Koike, S. Takeno, and N. Fukushima, Appl. Phys. Lett. 70, 1405 (1997); M. Izuha, K. Abe, and N. Fukushima, Jpn. J. Appl. Phys., Part 1 36, 5866 (1997).
9. R. Tsu, H. Y. Liu, W. Y. Hsu, S. Summerfelt, K. Aoki, and B. Gnade, Mater. Proc. Symp. 361, 275 (1995).
10. C. S. Hwang, S. O. Park, H. J. Cho, C. S. Kang, S. I. Lee, and M. Y. Lee, Appl. Phys. Lett. 67, 2819 (1995).
11. K. W. Van Keuls, R. R. Romanofsky, D. Y. Bohman, M. D. Winters, F. A. Miranda, C. H. Mueller, R. E. Treece, T. V. Rivkin, and D. Galt, Appl. Phys. Lett. 71, 3075 (1997).
12. K. R. Carroll, J. M. Pond, D. B. Chrisey, J. S. Horwitz, and R. E. Leuchtner, Appl. Phys. Lett. 62, 1845 (1993); 63, 1292 (1993).
13. K. R. Carroll, J. M. Pond, D. B. Chrisey, J. S. Horwitz, and R. E. Leuchtner, Appl. Phys. Lett. 62, 1845 (1993); 63, 1292 (1993).
14. O. Auciello, J. F. Scott, and R. Ramesh, Phys. Today 51, 22 (1998).
15. F. A. Miranda, R. R. Romanofsky, F. W. Van Keuls, C. H. Mueller, R. E. Treece, and T. V. Rivkin, Integr. Ferroelectr. 17, 231 (1997).
16. D. L. Kaiser, M. D. Vaudin, L. D. Rotter, Z. L. Wang, J. P. Cline, C. S. Hwang, R. B. Marinenko, and J. G. Gillen, Mater. Res. Soc. Symp. Proc. 361, 355 (1995).
17. J. S. Horwitz, J. M. Pond, B. Tadayan, R. C. Y. Auyeung, P. C. Dorsey, D. B. Chrisey, S. C. Qadri, and C. Muller, Mater. Res. Soc. Symp. Proc. 361, 515 (1995).
18. K. -H. Hellwege and A. M. Hellwege, "Ferroelectrics and Related Substances," subvolume a: Oxides, in Landolt-Bornstern Numerical Data and Functional Relationships in Science and Technology, edited by K. -H. Hellwege (Springer, Berlin, Heidelberg, and New York, 1981), Vol. 16.
19. K. N. Tu, Electronic Thin Film Science for Electrical Engineers and Materials Scientists (Macmillan, New York, 1994).
20. C. Basceri, S. K. Streiffer, A. I. Kingon, and R. Waser, J. Appl. Phys. 82, 2497 (1997).
21. S. Gevorgian, E. Carlsson, S. Rudner, L. -D. Wernlund, X. Wang, and U. Helwersson, IEEE Proc. Microm. Antennas Propag. 143 397 (1996).