Influence of sputter-etching of substrate on the microstructural and optical properties of ZnO films deposited by RF magnetron sputtering

Applied Surface Science

Volumn 257, Issue 14, 2011, Pages 5998-6003

  Li, C P ^a   Yang, B H ^a,b   Wang, X C ^b   Wang, F ^a,b   Li, M J ^b   Su, L ^a,b   Li, X W ^b  

^a TIANJIN UNIVERSITY   (China)

^b TIANJIN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Microstructure; Optical properties; Sputter etching; ZnO films

Indexed keywords

ENERGY GAP; ETCHING; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; II-VI SEMICONDUCTORS; MAGNETRON SPUTTERING; METALLIC FILMS; MICROSTRUCTURE; OPTICAL PROPERTIES; PHONONS; SUBSTRATES; ZINC OXIDE;

C-AXIS ORIENTATIONS; MICRO-STRUCTURAL; PHOTOLUMINESCENCE SPECTRUM; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; ROOT MEAN SQUARE ROUGHNESS; SPUTTER ETCHING; ZNO FILMS;

OPTICAL FILMS;

EID: 79953026818     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.01.093     Document Type: Article

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