-
1
-
-
11344261303
-
Diode laser atomic absorption spectrometry
-
DOI 10.1016/j.sab.2004.10.001, PII S0584854704002794
-
A. Zybin, J. Koch, H. D. Wizemann, J. Franzke, and K. Niemax, Spectrochim. Acta, Part B 60, 1 (2005). 10.1016/j.sab.2004.10.001 (Pubitemid 40073392)
-
(2005)
Spectrochimica Acta - Part B Atomic Spectroscopy
, vol.60
, Issue.1
, pp. 1-11
-
-
Zybin, A.1
Koch, J.2
Wizemann, H.D.3
Franzke, J.4
Niemax, K.5
-
2
-
-
33646018346
-
-
10.1080/05704920600620378
-
G. Galbacs, Appl. Spectrosc. Rev. 41, 259 (2006). 10.1080/ 05704920600620378
-
(2006)
Appl. Spectrosc. Rev.
, vol.41
, pp. 259
-
-
Galbacs, G.1
-
5
-
-
0032660701
-
-
10.1016/S0040-6090(98)01690-3
-
S. Nakamura, Thin Solid Films 343, 345 (1999). 10.1016/S0040-6090(98) 01690-3
-
(1999)
Thin Solid Films
, vol.343
, pp. 345
-
-
Nakamura, S.1
-
7
-
-
0036473075
-
Laser absorption spectroscopy with a blue diode laser in an aluminum hollow cathode discharge
-
DOI 10.1063/1.1430548
-
H. Scheibner, St. Franke, S. Soleyman, J. F. Behnke, C. Wilke, and A. Dinklage, Rev. Sci. Instrum. 73, 378 (2002). 10.1063/1.1430548 (Pubitemid 34192535)
-
(2002)
Review of Scientific Instruments
, vol.73
, Issue.I2
, pp. 378
-
-
Scheibner, H.1
Franke, St.2
Solyman, S.3
Behnke, J.F.4
Wilke, C.5
Dinklage, A.6
-
8
-
-
22144450704
-
Aluminium atom density and temperature in a dc magnetron discharge determined by means of blue diode laser absorption spectroscopy
-
DOI 10.1088/0022-3727/38/14/014, PII S0022372705943489
-
M. Wolter, H. T. Do, S. Hartmut, and R. Hippler, J. Phys. D: Appl. Phys. 38, 2390 (2005). 10.1088/0022-3727/38/14/014 (Pubitemid 40982976)
-
(2005)
Journal of Physics D: Applied Physics
, vol.38
, Issue.14
, pp. 2390-2395
-
-
Wolter, M.1
Do, H.T.2
Steffen, H.3
Hippler, R.4
-
9
-
-
34547871327
-
Blue diode laser absorption spectroscopy of pulsed magnetron discharge
-
DOI 10.1143/JJAP.45.8090
-
J. Olejnicek, H. T. Do, Z. Hubicka, R. Hippler, and L. Jastrabik, Jpn. J. Appl. Phys. 45, 8090 (2006). 10.1143/JJAP.45.8090 (Pubitemid 47253200)
-
(2006)
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
, vol.45
, Issue.B10
, pp. 8090-8094
-
-
Olejnicek, J.1
Do, H.T.2
Hubicka, Z.3
Hippler, R.4
Jastrabik, L.5
-
10
-
-
79051470524
-
-
10.1209/0295-5075/82/15002
-
L. de Poucques, C. Vitelaru, T. M. Minea, J. Bretagne, and G. Popa, Europhys. Lett. 82, 15002 (2008). 10.1209/0295-5075/82/15002
-
(2008)
Europhys. Lett.
, vol.82
, pp. 15002
-
-
Poucques, L.D.1
Vitelaru, C.2
Minea, T.M.3
Bretagne, J.4
Popa, G.5
-
11
-
-
18844388179
-
-
N. Beverini, G. Genovesi, M. Licchelli, F. Maccarrone, P. Marsili, and F. Strumia, Laser Phys. 8, 574 (1998).
-
(1998)
Laser Phys.
, vol.8
, pp. 574
-
-
Beverini, N.1
Genovesi, G.2
Licchelli, M.3
MacCarrone, F.4
Marsili, P.5
Strumia, F.6
-
13
-
-
22944489264
-
2 fundamental band of the methyl radical
-
DOI 10.1063/1.1812755, 014306
-
G. D. Stancu, J. Ropcke, and P. B. Davies, J. Chem. Phys. 122, 014306 (2005). 10.1063/1.1812755 (Pubitemid 41047764)
-
(2005)
Journal of Chemical Physics
, vol.122
, Issue.1
, pp. 1-11
-
-
Stancu, G.D.1
Ropcke, J.2
Davies, P.B.3
-
14
-
-
51849101133
-
-
10.1088/0963-0252/17/3/035020
-
R. Cazan, G. Borcia, A. Chiper, and G. Popa, Plasma Sources Sci. Technol. 17, 035020 (2008). 10.1088/0963-0252/17/3/035020
-
(2008)
Plasma Sources Sci. Technol.
, vol.17
, pp. 035020
-
-
Cazan, R.1
Borcia, G.2
Chiper, A.3
Popa, G.4
-
16
-
-
0042322517
-
-
10.1088/0963-0252/12/3/307
-
B. Clarenbach, B. Lorenz, M. Kramer, and N. Sadeghi, Plasma Sources Sci. Technol. 12, 345 (2003). 10.1088/0963-0252/12/3/307
-
(2003)
Plasma Sources Sci. Technol.
, vol.12
, pp. 345
-
-
Clarenbach, B.1
Lorenz, B.2
Kramer, M.3
Sadeghi, N.4
-
17
-
-
0036532816
-
Tunable diode laser line width and tuning measurements for gas analysis monitoring
-
DOI 10.1016/S1350-4495(01)00125-6, PII S1350449501001256
-
R. Brunner and M. Tacke, Infrared Phys. Technol. 43, 61 (2002). 10.1016/S1350-4495(01)00125-6 (Pubitemid 34116192)
-
(2002)
Infrared Physics and Technology
, vol.43
, Issue.2
, pp. 61-67
-
-
Brunner, R.1
Tacke, M.2
-
18
-
-
0000975178
-
-
10.1016/S0257-8972(99)00292-3
-
V. Kouznetsov, K. Macak, J. M. Schneider, U. Helmersson, and I. Petrov, Surf. Coat. Technol. 122, 290 (1999). 10.1016/S0257-8972(99)00292-3
-
(1999)
Surf. Coat. Technol.
, vol.122
, pp. 290
-
-
Kouznetsov, V.1
MacAk, K.2
Schneider, J.M.3
Helmersson, U.4
Petrov, I.5
-
19
-
-
27744509960
-
Reduction of transient regime in fast preionized high-power pulsed-magnetron discharge
-
DOI 10.1209/epl/i2005-10243-7
-
P. Vasina, M. Mesko, M. Ganciu, J. Bretagne, C. Boisse-Laporte, L. de Poucques, and M. Touzeau, Europhys. Lett. 72, 390 (2005). 10.1209/epl/i2005- 10243-7 (Pubitemid 41595896)
-
(2005)
Europhysics Letters
, vol.72
, Issue.3
, pp. 390-395
-
-
Vasina, P.1
Mesko, M.2
Ganciu, M.3
Bretagne, J.4
Boisse-Laporte, C.5
De Poucques, L.6
Touzeau, M.7
-
20
-
-
27844467175
-
-
M. Ganciu, S. Konstantinidis, Y. Paint, J. P. Dauchot, M. Hecq, L. de Poucques, P. Vasina, M. Mesko, J. C. Imbert, J. Bretagne, and M. Touzeau, J. Optoelectron. Adv. Mater. 7, 2481 (2005).
-
(2005)
J. Optoelectron. Adv. Mater.
, vol.7
, pp. 2481
-
-
Ganciu, M.1
Konstantinidis, S.2
Paint, Y.3
Dauchot, J.P.4
Hecq, M.5
Poucques, L.D.6
Vasina, P.7
Mesko, M.8
Imbert, J.C.9
Bretagne, J.10
Touzeau, M.11
-
21
-
-
1242329416
-
-
10.1116/1.1635391
-
O. Leroy, L. de Poucques, C. Boisse-Laporte, M. Ganciu, L. Teulé-Gay, and M. Touzeau, J. Vac. Sci. Technol. A 22, 192 (2004). 10.1116/1.1635391
-
(2004)
J. Vac. Sci. Technol. A
, vol.22
, pp. 192
-
-
Leroy, O.1
Poucques, L.D.2
Boisse-Laporte, C.3
Ganciu, M.4
Teulé-Gay, L.5
Touzeau, M.6
-
22
-
-
77949507035
-
-
10.1088/0022-3727/43/12/124013
-
C. Vitelaru, C. Aniculaesei, L. de Poucques, T. M. Minea, C. Boisse-Laporte, J. Bretagne, and G. Popa, J. Phys. D: Appl. Phys. 43, 124013 (2010). 10.1088/0022-3727/43/12/124013
-
(2010)
J. Phys. D: Appl. Phys.
, vol.43
, pp. 124013
-
-
Vitelaru, C.1
Aniculaesei, C.2
Poucques, L.D.3
Minea, T.M.4
Boisse-Laporte, C.5
Bretagne, J.6
Popa, G.7
-
23
-
-
33750581872
-
Study of the transport of titanium neutrals and ions in the post-discharge of a high power pulsed magnetron sputtering device
-
DOI 10.1088/0963-0252/15/4/010, PII S0963025206219923, 010
-
L. de Poucques, J. C. Imbert, C. Boisse-Laporte, J. Bretagne, M. Ganciu, L. Teule-Gay, and M. Touzeau, Plasma Sources Sci. Technol. 15, 661 (2006). 10.1088/0963-0252/15/4/010 (Pubitemid 44679411)
-
(2006)
Plasma Sources Science and Technology
, vol.15
, Issue.4
, pp. 661-669
-
-
De Poucques, L.1
Imbert, J.-C.2
Boisse-Laporte, C.3
Bretagne, J.4
Ganciu, M.5
Teule-Gay, L.6
Touzeau, M.7
|