Plasma characterization of an atmospheric microwave plasma torch using diode laser absorption studies of the argon 4s 3P2 state

Plasma Sources Science and Technology

Volumn 12, Issue 3, 2003, Pages 324-334

  Timmermans, E A H ^a   Van De Sande, M J ^a   Van Der Mullen, J J A M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ARGON; ATMOSPHERIC STRUCTURE; CARRIER CONCENTRATION; CHARACTERIZATION; DOPPLER EFFECT; IONIZATION; LASER APPLICATIONS; MICROWAVE HEATING; PLASMA DENSITY; SEMICONDUCTOR LASERS; VAN DER WAALS FORCES;

ATMOSPHERIC PLASMA TORCH; DIODE LASER ABSORPTION; MICROWAVE PLASMA TORCH; PLASMA CHARACTERIZATION; STARK EFFECT; THOMSON SCATTERING;

PLASMA TORCHES;

EID: 0042322580     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/12/3/305     Document Type: Article

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