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Volumn 515, Issue 20-21, 2007, Pages 7740-7743
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Effect of O2 concentration on metal-insulator transition properties of vanadium oxide thin films prepared by radio frequency magnetron sputtering
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Author keywords
Deposition; Metal insulator transition; Sputtering; Vanadium oxide
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Indexed keywords
CONCENTRATION (PROCESS);
DEPOSITION;
ELECTRIC PROPERTIES;
FILM PREPARATION;
MAGNETRON SPUTTERING;
METAL INSULATOR TRANSITION;
THIN FILMS;
VANADIUM COMPOUNDS;
RADIO FREQUENCY MAGNETRON SPUTTERING;
VANADIUM OXIDE;
OXYGEN;
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EID: 34547688851
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2007.03.066 Document Type: Article |
Times cited : (13)
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References (13)
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