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Volumn 515, Issue 20-21, 2007, Pages 7740-7743

Effect of O2 concentration on metal-insulator transition properties of vanadium oxide thin films prepared by radio frequency magnetron sputtering

Author keywords

Deposition; Metal insulator transition; Sputtering; Vanadium oxide

Indexed keywords

CONCENTRATION (PROCESS); DEPOSITION; ELECTRIC PROPERTIES; FILM PREPARATION; MAGNETRON SPUTTERING; METAL INSULATOR TRANSITION; THIN FILMS; VANADIUM COMPOUNDS;

EID: 34547688851     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.03.066     Document Type: Article
Times cited : (13)

References (13)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.