A comparison between gas and atomized liquid precursor states in the deposition of functional coatings by pin corona plasma

Plasma Processes and Polymers

Volumn 8, Issue 3, 2011, Pages 230-238

  Herbert, Peter Anthony Fry ^a   O'Neill, Liam ^b   Jaroszyńska Wolińska, Justyna ^c   Stallard, Charlie Patrick ^d   Ramamoorthy, Amsarani ^d   Dowling, Denis Pius ^d  

^a Plasma Ireland Ltd   (Ireland)

^b Irish Surface Engineering   (Ireland)

^c LUBLIN UNIVERSITY OF TECHNOLOGY   (Poland)

^d UNIVERSITY COLLEGE DUBLIN   (Ireland)

Author keywords

atmospheric pressure plasma; functional coatings; gas vs. liquid precursor deposition; non equilibrium; pin corona; soft plasma polymerization

Indexed keywords

ATMOSPHERIC PRESSURE PLASMAS; FUNCTIONAL COATINGS; NON EQUILIBRIUM; PIN CORONA; SOFT PLASMA POLYMERIZATION;

ATMOSPHERIC AEROSOLS; ATMOSPHERIC PRESSURE; ATMOSPHERICS; CONTACT ANGLE; FUNCTIONAL POLYMERS; GASES; HELIUM; LIQUIDS; MONOMERS; PLASMA DEPOSITION; PLASMA SOURCES; POLYMERS; PROTECTIVE COATINGS; TOLUENE;

PLASMA POLYMERIZATION;

EID: 79952672994     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201000119     Document Type: Article

References (29)

1. A. Grill, Cold Plasmas in Material Fabrication, IEEE Press, New York 1994.
2. H. Yasuda, J. Polym. Sci.: Macromol. Rev. 1981, 16, 199.
3. M. E. Ryan, A. M. Hynes, J. P. S. Badyal, Chem. Mater. 1996, 8, 37.
4. S. Schiller, J. Hu, A. T. A. Jenkins, R. B. Timmons, F. S. Sanchez-Estrada, W. Knoll, R. Forch, Chem. Mater. 2002, 14, 235.
5. R. Forch, Z. Zhang, W. Knoll, Plasma Process Polym. 2005, 2, 351.
6. K. Yoshimura, K. Hozumi, J. Photopolym. Sci. Technol. 1996, 9, 225.
7. G. Lopez, B. D. Ratner, ACS Polym. Mater. Sci. Eng. 1990, 62, 14.
8. V. Krishnamurthy, I. L. Kamel, Y. Mei, J. Polym. Sci., Part A: Polym. Chem. 1989, 27, 1211.
9. L. J. Ward, W. C. E. Schofield, J. P. S. Badyal, A. J. Goodwin, P. J. Merlin, Chem. Mater. 2003, 15, 1466.
10. L. J. Ward, W. C. E. Schofield, J. P. S. Badyal, A. J. Goodwin, P. J. Merlin, Langmuir 2003, 19, 2110.
11. F. Massines, G. Gouda, J. Phys. D: Appl. Phys. 1998, 31, 3411.
12. L.-A. O'Hare, L. O'Neill, A. J. Goodwin, Surf. Interface Anal. 2006, 38, 1519.
13. J. D. Albaugh, C. O'Sullivan, L. O'Neill, Surf. Coat. Technol. 2008, 203, 844.
14. B. Twomey, D. Dowling, L. O'Neill, L.-A. O'Hare, Plasma Process Polym. 2007, 4, S450.
15. P. Heyse, R. Dams, S. Paulussen, K. Houthoofd, K. Janssen, P. A. Jacobs, B. F. Sels, Plasma Process Polym. 2007, 2, 145.
16. M. Tatoulian, F. Arefi-Khonsari, Plasma Process Polym. 2007, 4, 360.
17. A. J. Beck, R. D. Short, A. Matthews, Surf. Coat. Technol. 2008, 203, 822.
18. L. O'Neill, P. A. F. Herbert, C. Stallard, D. Dowling, Plasma Process Polym. 2010, 7, 43.
19. P. A. F. Herbert, L. O'Neill, J. Jaroszynska-Wolinska, Chem. Mater. 2009, 21, 4401.
20. L. O'Neill, C. O'Sullivan, Chem. Vap. Deposition 2009, 1-3, 21.
21. C. E. Nwankire, V. J. Law, A. Nindrayog, B. Twomey, K. Niemi, V. MilosavljeviÄ, W. G. Graham, D. P. Dowling, Plasma Chem. Plasma Process. 2010, DOI: 10.1007/s11090-010-9236-5.
22. S. R. Coulson, I. S. Woodward, J. P. S. Badyal, S. A. Brewer, C. Willis, Langmuir 2000, 16, 6287.
23. F. Fanelli, F. Fracassi, R. d'Agostino, Plasma Process Polym. 2007, 4, S430.
24. F. Fanelli, G. Di Renzo, F. Fracassi, R. d'Agostino, Plasma Process Polym. 2009, 6, S503.
25. L. Laguardia, D. Ricci, E. Vassallo, A. Cremona, E. Mesto, F. Grezzi, F. Dellera, Macromol. Symp. 2007, 247, 295.
26. S. R. Coulson, I. S. Woodward, J. P. S. Badyal, S. A. Brewer, C. Willis, Chem. Mater. 2000, 12, 2031.
27. A. Hynes, et al. " Generation and Control of Wide-area Homogeneous Atmospheric Pressure Glow Discharges for Industrial Coating Applications ", Hakone IX International Symposium on High Pressure, Low Temperature Plasma Chemistry, Padova, Italy 2004, pp. 80-103.
28. L. O'Neill, N. Shephard, S. R. Leadley, L. A. O'Hare, J. Adhes. 2008, 84, 562.
29. P. A. F. Herbert, "Investigation of droplet behaviour in the deposition of functional coatings using atomised liquid precursors in cool, atmospheric pressure plasma", Hakone XI Proceedings of 11th International Symposium on High Pressure, Low Temperature Plasma Chemistry, Oleron Island, France, 7-11 September 2008, pp. 488-492.