Approaches to single wafer high current ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 237, Issue 1-2, 2005, Pages 284-289

  Renau, A ^a  

^a VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES   (United States)

Author keywords

Angle control; Energy contamination; Ion implantation

Indexed keywords

CONSTRAINT THEORY; ION IMPLANTATION; PROBLEM SOLVING; RELIABILITY; SEMICONDUCTOR DOPING; THERMAL EFFECTS;

ANGLE CONTROL; ENERGY CONTAMINATION;

SILICON WAFERS;

EID: 23444432358     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.05.016     Document Type: Conference Paper

References (9)

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