Temperature dependent photoluminescence studies of ZnO thin film grown on (1 1 1) YSZ substrate

Journal of Crystal Growth

Volumn 319, Issue 1, 2011, Pages 8-12

  Sentosa, D ^a   Liu, B ^b   Wong, L M ^a   Lim, Y V ^a   Wong, T I ^a   Foo, Y L ^a   Sun, H D ^b   Wang, S J ^a  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

A1. Characterization; A3. Laser epitaxy; B1. Oxides; B2. Semiconducting materials; B3. Light emitting diodes

Indexed keywords

A1. CHARACTERIZATION; A3. LASER EPITAXY; B1. OXIDES; B3. LIGHT EMITTING DIODES; SEMICONDUCTING MATERIALS;

ACTIVATION ENERGY; DEPOSITION; EPITAXIAL GROWTH; EXCITONS; FULL WIDTH AT HALF MAXIMUM; LIGHT EMISSION; LIGHT EMITTING DIODES; METALLIC FILMS; OPTICAL FILMS; PHONONS; PHOTOLUMINESCENCE; PULSED LASER DEPOSITION; SEMICONDUCTOR QUANTUM WELLS; SINGLE CRYSTALS; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; ZINC OXIDE;

PULSED LASERS;

EID: 79952622002     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2011.01.029     Document Type: Article

References (25)

1. A. Tsukazaki, A. Ohtomo, T. Onuma, M. Ohtani, T. Makino, M. Sumiya, K. Ohtani, S.F. Chichibu, S. Fuke, Y. Segawa, H. Ohno, H. Koinuma, and M. Kawasaki Nat. Mater. 4 2005 42 46
2. . zgr, Y.I. Alivov, C. Liu, A. Teke, M.A. Reshchikov, S. Doan, V. Avrutin, S.J. Cho, and H. Morko J. Appl. Phys. 98 2005 041301
3. K.-K. Kim, J.-H. Song, H.-J. Jung, W.-K. Choi, S.-J. Park, and J.-H. Song J. Appl. Phys. 87 2000 3573
4. P. Fons, K. Iwata, S. Niki, A. Yamada, and K. Matsubara J. Cryst. Growth 201202 1999 627
5. Y. Liu, C.R. Gorla, S. Liang, N. Emanetoglu, Y. Lu, H. Shen, and M. Wraback J. Electron. Mater. 29 2000 69
6. R.D. Vispute Appl. Phys. Lett. 73 1998 348
7. H. Ohta, H. Tanji, M. Orita, H. Hosono, and H. Kawazoe Mater. Res. Soc. Symp. Proc. 570 1999 309
8. Y.-C. Chao, C.-W. Lin, D.J. E, Y. Wu, G. Chen, L. Chang, Y.T. Ho, and M.-H. Liang J. Cryst. Growth 298 2007 461
9. C.-W. Lin, Y.-T. Ho, and L. Chang Mater. Chem. Phys. 108 2008 160
10. H. Verma, D. Mukherjee, S. Witanachchi, P. Mukherjee, and M. Batzill J. Cryst. Growth 312 2010 2012
11. P. Misra, and L.M. Kukreja Thin Solid Films 485 2005 42
12. P. Misra, T.K. Sharma, and L.M. Kukreja Curr. Appl. Phys. 9 2009 179
13. S.J. Wang, T.I. Wong, Q. Chen, M. Yang, L.M. Wong, J.W. Chai, Z. Zhang, J.S. Pan, and Y.P. Feng Phys. Status Solidi (a) 207 2010 1731
14. A.B.M.A. Ashrafi, N.T. Binh, B.-P. Zhang, and Y. Segawa Appl. Phys. Lett. 84 2004 2814
15. C.H. Ahn, Y.Y. Kim, D.C. Kim, S.K. Mohanta, and H.K. Cho J. Appl. Phys. 105 2009 013502
16. M.D. McCluskey, and S.J. Jokela J. Appl. Phys. 106 2009 071101
17. C.F. Klingshirn Semiconductor Optics second ed. 1995 Springer Berlin
18. B.K. Meyer, H. Alves, and D.M. Hofmann Phys. Status Solidi (b) 241 2004 231
19. A. Tsukazaki, A. Ohtomo, and M. Kawasaki Appl. Phys. Lett. 84 2004 3858
20. D.M. Bagnall, Y.F. Chen, M.Y. Shen, Z. Zhu, T. Goto, and T. Yao J. Cryst. Growth 184/185 1998 605
21. Y. Chen, D.M. Bagnall, H.-J. Koh, K.-T. Park, K. Hiraga, Z. Zhu, and T. Yao J. Appl. Phys. 84 1998 3912
22. Y.P. Varshi Physica 34 1967 149
23. P. Misra, T.K. Sharma, S. Porwal, and L.M. Kukreja Appl. Phys. Lett. 89 2006 161912
24. N.H. Alvi, M. Riaz, G. Tzamalis, O. Nur, and M. Willander Solid State Electron. 54 2010 536
25. A. Teke,. zgr, S. Doan, X. Gu, H. Morko, B. Nemeth, J. Nause, and H.O. Everitt Phys. Rev. B 70 2004 195207