Spectroscopic ellipsometry studies on hydrogenated amorphous silicon thin films deposited using DC saddle field plasma enhanced chemical vapor deposition system

Thin Solid Films

Volumn 519, Issue 9, 2011, Pages 2863-2866

  Saha, Jhantu Kumar ^a   Bahardoust, Barzin ^a   Leong, Keith ^a   Gougam, Adel B ^b   Kherani, Nazir P ^a   Zukotynski, Stefan ^a  

^a UNIVERSITY OF TORONTO   (Canada)

^b Arise Technologies Corporation   (Canada)

Author keywords

DC saddle field; Hydrogenated amorphous silicon; Spectroscopic ellipsometry

Indexed keywords

A-SI:H; BONDED HYDROGEN; COMPLEX DIELECTRIC FUNCTIONS; CRYSTALLINE SILICON SUBSTRATES; DC SADDLE FIELD; DEPOSITION TEMPERATURES; ENERGY RANGES; HYDROGEN CONTENTS; HYDROGENATED AMORPHOUS SILICON; HYDROGENATED AMORPHOUS SILICON (A-SI:H); HYDROGENATED AMORPHOUS SILICON THIN FILMS; INTERFACE PROPERTY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEMS; ROOM TEMPERATURE; SILICON BONDING; SUBSTRATE TEMPERATURE;

AMORPHOUS FILMS; DEPOSITION; HYDROGEN; HYDROGENATION; METALLIC FILMS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON COMPOUNDS; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION;

AMORPHOUS SILICON;

EID: 79952618608     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.12.074     Document Type: Article

References (32)

1. M. Konagai 15th Program Review Meeting of the National-Center-for- Photovoltaics, Denver, CO, Sep. 09-11 1998 73
2. E. Leobandung, L. Guo, Y. Wang, and S.Y. Chou Appl. Phys. Lett. 67 1995 938
3. S. Tiwari, F. Rana, H. Hanafi, A. Hartstein, E.F. Crabbe, and K. Chan Appl. Phys. Lett. 68 1996 1377
4. P.J. Zanzucchi, C.R. Wronski, and D.E. Carlson J. Appl. Phys. 48 1997 5227
5. G.D. Cody, C.R. Wronski, B. Abeles, R.B. Stephens, and B. Brooks Sol. Cells 2 1980 227
6. D.E. Aspnes E.D. Palik, Handbook of Optical Constants of Solids 1985 Academic Press London 89
7. I. An, H.V. Nguyen, N.V. Nguyen, and R.W. Collins Phys. Rev. Lett. 65 1990 2274
8. H. Tannio, G. Ganguli, and A. Matsuda Phys. Rev. B 46 1992 15277
9. W. Futako, K. Yoshino, C.M. Fortmann, and I. Shimazu J. Appl. Phys. 85 1999 812
10. W. Futako, K. Yoshino, C.M. Fortmann, and I. Shimazu J. Appl. Phys. 84 1998 1333
11. J.K. Saha, N. Ohse, K. Hamada, K. Haruta, T. Kobayashi, T. Ishikawa, Y. Takemura, and H. Shirai Jpn. J. Appl. Phys. 46 2007 L696
12. R.V. Kruzelecky, S. Zukotynski, C.I. Ukah, F. Gaspari, and J.M. Perz J. Vac. Sci. Technol. A 7 1989 2632
13. B. Bahardoust, A. Chutinan, K. Leong, A.B. Gougam, D. Yeghikyan, T. Kosteski, N.P. Kherani, and S. Zukotynski Phys. Status Solidi A 207 2010 539
14. R.M.A. Azam, and N.M. Bashara Ellipsometry and polarized light 1977 North-Holland Amsterdam
15. Numerical receipes 1986 Cambridge University Press 523
16. A.R. Forouchi, and I. Bloomer Phys. Rev. B 34 1986 7018
17. S. Adachi Phys. Rev., B 38 1987 12345
18. G.E. Jellison Jr., and F.A. Modine Appl. Phys. Lett. 69 1996 371
19. I.H. Malitson J. Opt. Soc. Am. 55 1965 1205
20. F. Wooton Optical Properties of Solids 1972 Academic Press New York
21. J. Tauc, R. Grigorovichi, and A. Vancu Phys. Status Solidi 15 1966 627
22. A.G. Bruggeman Ann. Phys. Liepzig 24 1935 636
23. C.G. Cranquist, and O. Hunderi Phys. Rev. B 16 1977 3513
24. E. Hartmann, P.O. Hahn, and R.J. Behm J. Appl. Phys. 69 1991 4273
25. S. Adachi Optical constants in crystalline and amorphous semiconductors: numerical data and graphical information 1999 Kluwer Academic Press Boston
26. S. Adachi Phys. Rev. B 62 2000 10158
27. D.E. Aspnes, A.A. Studna, and E. Kinsbron Phys. Rev. B 29 1984 768
28. G.D. Cody J.I. Pankove, Semiconductors and semimetals vol. 21B 1984 Academic Press New York 11
29. G.E. Jellison H.G. Tompkins, E.A. Irene, Handbook of ellipsometry 2005 William Andrew Publishing NY
30. G.E. Jellison Jr. Opt. Mater. 1 1992 41
31. H. Fujiwara, and M. Kondo Appl. Phys. Lett. 90 2007 013503
32. http://rsb.info.nih.gov/ij/docs/