Synthesis of microcrystalline silicon films using high-density microwave plasma source from dichlorosilane

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 46, Issue 25-28, 2007, Pages

  Saha, Jhantu Kumar ^a   Ohse, Naoyuki ^a   Hamada, Kazu ^a   Haruta, Koji ^a   Kobayashi, Tomohiro ^b   Ishikawa, Tatsuo ^c   Takemura, Yu Ichiro ^d   Shirai, Hajime ^a  

^a SAITAMA UNIVERSITY   (Japan)

^b INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

^c HORIBA LTD   (Japan)

^d JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

C Si:H:Cl; High density plasma; Microwave plasma; SiH2Cl2

Indexed keywords

ELLIPSOMETRY; FILM GROWTH; PLASMAS; SYNTHESIS (CHEMICAL); THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ΜC-SI:H:CL; HIGH-DENSITY PLASMA; MICROWAVE PLASMA;

MICROCRYSTALLINE SILICON;

EID: 34547838437     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.L696     Document Type: Article

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