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Applied Surface Science

Volumn 257, Issue 13, 2011, Pages 5508-5512

Research of microstructural characteristics on nanocrystalline diamond by microwave plasma CVD

(6) Hung, Jing Ming a Lin, Li Hsiang a,b Shih, Yung Hsun a,c Liu, Chung Ming a,d Cheng, Hsin Chung a,b Ou, Keng Liang a

a TAIPEI MEDICAL UNIVERSITY (Taiwan)

b TAIPEI MEDICAL UNIVERSITY HOSPITAL (Taiwan)

c TAIPEI MEDICAL UNIVERSITY (Taiwan)

d LUNGHWA UNIVERSITY OF SCIENCE AND TECHNOLOGY (Taiwan)

Author keywords

Chemical vapor deposition; Microstructure; Microwave plasma; Nanocrystalline diamond; Wettability

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; HYDROPHOBICITY; LIGHT TRANSMISSION; MICROSTRUCTURE; MICROWAVES; NANOCRYSTALS; OPTICAL EMISSION SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SURFACE CHEMISTRY; TRANSMISSION ELECTRON MICROSCOPY; WETTING;

HYDROPHOBIC SURFACES; MICRO-STRUCTURAL CHARACTERISTICS; MICROWAVE PLASMA; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITIONS; MICROWAVE PLASMA CVD; MODERATE TEMPERATURE; NANO-CRYSTALLINE DIAMONDS; NANOCRYSTALLINE DIAMOND FILMS;

PLASMA CVD;

EID: 79952515599 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2010.12.134 Document Type: Article

Times cited : (11)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.